Inventor · disambiguated record
Wenling Wang
Also filed as: WANG WENLING
26 granted patents·8 pending applications·243 citations·filing 2000–2018
95Inventor score
Files withTOKYO ELECTRON LTD21YOSHII KOJI7HENAN CIGARETTE IND TOBACCO SHEET LTD1PARK YOUNGCHUL1Tokyo Electron Limitetd1
Top patents by PatentIndex Score
34 records- 0189US6622104B2Heat treatment apparatus, calibration method for temperature measuring system of the apparatus, and heat treatment systemTOKYO ELECTRON LTD·Filed 2001·Granted Sep 16, 2003·41 cites·19 claims
- 0285US7138607B2Determining method of thermal processing conditionTOKYO ELECTRON LTD·Filed 2004·Granted Nov 21, 2006·30 cites·22 claims
- 0385US6803548B2Batch-type heat treatment apparatus and control method for the batch-type heat treatment apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Oct 12, 2004·36 cites·21 claims
- 0481US8080767B2Thermal processing apparatus and thermal processing method for object to be processedYAMAGA KENICHI·Filed 2009·Granted Dec 20, 2011·9 cites·40 claims
- 0580US8354135B2Thermal processing apparatus, method for regulating temperature of thermal processing apparatus, and programTOKYO ELECTRON LTD·Filed 2009·Granted Jan 15, 2013·4 cites·8 claims
- 0680US6329643B1Method of temperature-calibrating heat treating apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Dec 11, 2001·28 cites·20 claims
- 0778US6730885B2Batch type heat treatment system, method for controlling same, and heat treatment methodTOKYO ELECTRON LTD·Filed 2001·Granted May 4, 2004·23 cites·17 claims
- 0875US9259761B2Heat treatment system, heat treatment method, and non-transitory computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2013·Granted Feb 16, 2016·3 cites·3 claims
- 0975US8055372B2Processing system, processing method, and computer programTOKYO ELECTRON LTD·Filed 2008·Granted Nov 8, 2011·5 cites·17 claims
- 1075US6787377B2Determining method of thermal processing conditionTOKYO ELECTRON LTD·Filed 2001·Granted Sep 7, 2004·16 cites·31 claims
- 1171US7896649B2Heat system, heat method, and programTOKYO ELECTRON LTD·Filed 2008·Granted Mar 1, 2011·4 cites·16 claims
- 1271US6922522B2Heat treatment apparatus, calibration method for temperature measuring system of the apparatus, and heat treatment systemTOKYO ELECTRON LTD·Filed 2003·Granted Jul 26, 2005·15 cites·7 claims
- 1368US9207665B2Heat treatment apparatus and method of controlling the sameTOKYO ELECTRON LTD·Filed 2013·Granted Dec 8, 2015·2 cites·4 claims
- 1468US6495805B2Method of determining set temperature trajectory for heat treatment systemTOKYO ELECTRON LTD·Filed 2001·Granted Dec 17, 2002·12 cites·20 claims
- 1567US9324591B2Heat treatment apparatus and heat treatment methodYOSHII KOJI·Filed 2012·Granted Apr 26, 2016·2 cites·2 claims
- 1665US7860585B2Heat processing apparatus, method of automatically tuning control constants, and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Dec 28, 2010·2 cites·21 claims
- 1761US9209057B2Temperature control method, storage medium storing a program therefor, temperature control apparatus, and heat treatment apparatusYOSHII KOJI·Filed 2012·Granted Dec 8, 2015·1 cites·12 claims
- 1860US9255736B2Vertical-type heat treatment apparatusYOSHII KOJI·Filed 2011·Granted Feb 9, 2016·1 cites·8 claims
- 1960US7953512B2Substrate processing system, control method for substrate processing apparatus and program stored on mediumTokyo Electron Limitetd·Filed 2008·Granted May 31, 2011·2 cites·6 claims
- 2054US9748122B2Thermal processing apparatus and method of controlling the sameTOKYO ELECTRON LTD·Filed 2014·Granted Aug 29, 2017·0 cites·10 claims
- 2154US7625604B2Heat treatment method and heat treatment apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Dec 1, 2009·5 cites·11 claims
- 2251US7869888B2Information processing apparatus, semiconductor manufacturing system, information processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Jan 11, 2011·0 cites·22 claims
- 2348US8835811B2Thermal processing apparatus and method of controlling the sameYOSHII KOJI·Filed 2012·Granted Sep 16, 2014·0 cites·12 claims
- 2448US6847015B2Heat treatment apparatus and controller for heat treatment apparatus and control method for heat treatment apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Jan 25, 2005·2 cites·24 claims
- 2545US2011035165A1Information processing apparatus, semiconductor manufacturing system, information processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 2644US9909809B2Heat treatment apparatus and method of controlling the sameTOKYO ELECTRON LTD·Filed 2013·Granted Mar 6, 2018·0 cites·5 claims
- 2742US2013256293A1Heat treatment system, heat treatment method, and non-transitory computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2839US2013065189A1Thermal treatment apparatus, temperature control system, thermal treatment method, temperature control method, and non-transitory computer readable medium embodied with program for executing the thermal treatment method or the temperature control methodYOSHII KOJI·Filed 2012·Application pending·0 cites
- 2938US2012251966A1Heat treatment control system and heat treatment control methodYOSHII KOJI·Filed 2012·Application pending·0 cites
- 3037US10781507B2Anti-fatigue in-situ aluminum-based composite material for heavy-load hubs and preparation method thereforUNIV JIANGSU·Filed 2016·Granted Sep 22, 2020·0 cites·7 claims
- 3137US2012064469A1Vertical-type heat treatment apparatus, and control method for sameYOSHII KOJI·Filed 2011·Application pending·0 cites
- 3237US2007074660A1Thermal processing appratus and thermal processing methodPARK YOUNGCHUL·Filed 2004·Application pending·0 cites
- 3336US2020178590A1Preparation method of tobacco sheets with a reduced quantity of wood pulp fibersHENAN CIGARETTE IND TOBACCO SHEET LTD·Filed 2018·Application pending·0 cites
- 3435US2002127828A1Method of processing waferFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →