Inventor · disambiguated record
Whonchee Lee
Also filed as: LEE WHONCHEE
77 granted patents·8 pending applications·1,168 citations·filing 1995–2015
99Inventor score
Top patents by PatentIndex Score
85 records- 0197US7709341B2Methods of shaping vertical single crystal silicon walls and resulting structuresMICRON TECHNOLOGY INC·Filed 2006·Granted May 4, 2010·44 cites·35 claims
- 0297US7628932B2Wet etch suitable for creating square cuts in siMICRON TECHNOLOGY INC·Filed 2006·Granted Dec 8, 2009·45 cites·29 claims
- 0397US6383934B1Method and apparatus for chemical-mechanical planarization of microelectronic substrates with selected planarizing liquidsMICRON TECHNOLOGY INC·Filed 2000·Granted May 7, 2002·73 cites·98 claims
- 0496US6533893B2Method and apparatus for chemical-mechanical planarization of microelectronic substrates with selected planarizing liquidsMICRON TECHNOLOGY INC·Filed 2002·Granted Mar 18, 2003·72 cites·30 claims
- 0595US7378353B2High selectivity BPSG to TEOS etchantMICRON TECHNOLOGY INC·Filed 2005·Granted May 27, 2008·23 cites·13 claims
- 0693US8101060B2Methods and apparatuses for electrochemical-mechanical polishingLEE WHONCHEE·Filed 2010·Granted Jan 24, 2012·10 cites·20 claims
- 0792US7670466B2Methods and apparatuses for electrochemical-mechanical polishingMICRON TECHNOLOGY INC·Filed 2006·Granted Mar 2, 2010·15 cites·20 claims
- 0890US8159050B2Single crystal silicon structuresFUCSKO JANOS·Filed 2010·Granted Apr 17, 2012·9 cites·19 claims
- 0990US6632719B1Capacitor structures with recessed hemispherical grain siliconMICRON TECHNOLOGY INC·Filed 2000·Granted Oct 14, 2003·40 cites·26 claims
- 1089US9593431B2Electroplating systemsMICRON TECHNOLOGY INC·Filed 2013·Granted Mar 14, 2017·6 cites·12 claims
- 1188US6605539B2Electro-mechanical polishing of platinum container structureMICRON TECHNOLOGY INC·Filed 2001·Granted Aug 12, 2003·35 cites·33 claims
- 1286US7973388B2Semiconductor structures including square cuts in single crystal siliconMICRON TECHNOLOGY INC·Filed 2009·Granted Jul 5, 2011·7 cites·14 claims
- 1386US7153777B2Methods and apparatuses for electrochemical-mechanical polishingMICRON TECHNOLOGY INC·Filed 2004·Granted Dec 26, 2006·21 cites·24 claims
- 1485US6867448B1Electro-mechanically polished structureMICRON TECHNOLOGY INC·Filed 2000·Granted Mar 15, 2005·26 cites·13 claims
- 1584US6783694B1Composition for selectively etching against cobalt silicideMICRON TECHNOLOGY INC·Filed 2000·Granted Aug 31, 2004·21 cites·24 claims
- 1683US7078308B2Method and apparatus for removing adjacent conductive and nonconductive materials of a microelectronic substrateMICRON TECHNOLOGY INC·Filed 2002·Granted Jul 18, 2006·21 cites·28 claims
- 1783US6346750B1Resistance-reducing conductive adhesives for attachment of electronic componentsMICRON TECHNOLOGY INC·Filed 2000·Granted Feb 12, 2002·23 cites·26 claims
- 1883US5990019ASelective etching of oxidesMICRON TECHNOLOGY INC·Filed 1997·Granted Nov 23, 1999·58 cites·31 claims
- 1982US6074960AMethod and composition for selectively etching against cobalt silicideMICRON TECHNOLOGY INC·Filed 1997·Granted Jun 13, 2000·42 cites·42 claims
- 2081US7160176B2Methods and apparatus for electrically and/or chemically-mechanically removing conductive material from a microelectronic substrateMICRON TECHNOLOGY INC·Filed 2001·Granted Jan 9, 2007·10 cites·51 claims
- 2181US5685951AMethods and etchants for etching oxides of silicon with low selectivity in a vapor phase systemMICRON TECHNOLOGY INC·Filed 1996·Granted Nov 11, 1997·53 cites·31 claims
- 2280US7112122B2Methods and apparatus for removing conductive material from a microelectronic substrateMICRON TECHNOLOGY INC·Filed 2003·Granted Sep 26, 2006·10 cites·56 claims
- 2380US6200909B1Method for selective etching of antireflective coatingsMICRON TECHNOLOGY INC·Filed 2000·Granted Mar 13, 2001·18 cites·43 claims
- 2480US6087273AProcess for selectively etching silicon nitride in the presence of silicon oxideMICRON TECHNOLOGY INC·Filed 1999·Granted Jul 11, 2000·49 cites·12 claims
- 2578US7220166B2Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrateMICRON TECHNOLOGY INC·Filed 2002·Granted May 22, 2007·16 cites·45 claims
- 2677US7094131B2Microelectronic substrate having conductive material with blunt cornered apertures, and associated methods for removing conductive materialMICRON TECHNOLOGY INC·Filed 2001·Granted Aug 22, 2006·11 cites·49 claims
- 2776US7708875B2Noncontact localized electrochemical deposition of metal thin filmsMICRON TECHNOLOGY INC·Filed 2006·Granted May 4, 2010·3 cites·16 claims
- 2876US7192335B2Method and apparatus for chemically, mechanically, and/or electrolytically removing material from microelectronic substratesMICRON TECHNOLOGY INC·Filed 2002·Granted Mar 20, 2007·16 cites·59 claims
- 2976US6391793B2Compositions for etching silicon with high selectivity to oxides and methods of using sameMICRON TECHNOLOGY INC·Filed 1999·Granted May 21, 2002·40 cites·31 claims
- 3075US8294246B2Semiconductor structures including square cuts in single crystal silicon and method of forming sameLEE WHONCHEE·Filed 2011·Granted Oct 23, 2012·2 cites·19 claims
- 3175US7604729B2Methods and apparatus for selectively removing conductive material from a microelectronic substrateMICRON TECHNOLOGY INC·Filed 2006·Granted Oct 20, 2009·4 cites·19 claims
- 3275US7435324B2Noncontact localized electrochemical deposition of metal thin filmsMICRON TECHNOLOGY INC·Filed 2004·Granted Oct 14, 2008·12 cites·19 claims
- 3375US6759343B2Method and composition for selectively etching against cobalt silicideMICRON TECHNOLOGY INC·Filed 2002·Granted Jul 6, 2004·11 cites·29 claims
- 3475US6660180B2Compositions for etching silicon with high selectivity to oxides and methods of using sameMICRON TECHNOLOGY INC·Filed 2001·Granted Dec 9, 2003·18 cites·11 claims
- 3574US7112121B2Methods and apparatus for electrical, mechanical and/or chemical removal of conductive material from a microelectronic substrateMICRON TECHNOLOGY INC·Filed 2001·Granted Sep 26, 2006·14 cites·124 claims
- 3674US6409936B1Composition and method of formation and use therefor in chemical-mechanical polishingMICRON TECHNOLOGY INC·Filed 1999·Granted Jun 25, 2002·22 cites·33 claims
- 3773US5885903AProcess for selectively etching silicon nitride in the presence of silicon oxideMICRON TECHNOLOGY INC·Filed 1997·Granted Mar 23, 1999·34 cites·10 claims
- 3873US5716535AMethods and etchants for etching oxides of silicon with low selectivityMICRON TECHNOLOGY INC·Filed 1996·Granted Feb 10, 1998·33 cites·29 claims
- 3972US6825570B2Resistance-reducing conductive adhesives for attachment of electronic componentsMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 30, 2004·6 cites·47 claims
- 4070US6232232B1High selectivity BPSG to TEOS etchantMICRON TECHNOLOGY INC·Filed 1998·Granted May 15, 2001·27 cites·16 claims
- 4169US8450214B2Methods of etching single crystal siliconLEE WHONCHEE·Filed 2012·Granted May 28, 2013·1 cites·19 claims
- 4269US7153195B2Methods and apparatus for selectively removing conductive material from a microelectronic substrateMICRON TECHNOLOGY INC·Filed 2002·Granted Dec 26, 2006·9 cites·63 claims
- 4369US5981401AMethod for selective etching of anitreflective coatingsMICRON TECHNOLOGY INC·Filed 1998·Granted Nov 9, 1999·27 cites·15 claims
- 4466US8048756B2Method for removing metal layers formed outside an aperture of a BPSG layer utilizing multiple etching processes including electrochemical-mechanical polishingMICRON TECHNOLOGY INC·Filed 2010·Granted Nov 1, 2011·1 cites·20 claims
- 4565US8419906B2Electroplating systemsRAMARAJAN SURESH·Filed 2008·Granted Apr 16, 2013·2 cites·17 claims
- 4664US7618528B2Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrateMICRON TECHNOLOGY INC·Filed 2006·Granted Nov 17, 2009·1 cites·14 claims
- 4764US6103637AMethod for selective etching of antireflective coatingsMICRON TECHNOLOGY INC·Filed 1999·Granted Aug 15, 2000·21 cites·14 claims
- 4863US8048287B2Method for selectively removing conductive material from a microelectronic substrateROUND ROCK RES LLC·Filed 2009·Granted Nov 1, 2011·0 cites·3 claims
- 4963US7153410B2Methods and apparatus for electrochemical-mechanical processing of microelectronic workpiecesMICRON TECHNOLOGY INC·Filed 2002·Granted Dec 26, 2006·8 cites·42 claims
- 5063US6029680AMethod for in situ removal of particulate residues resulting from cleaning treatmentsMICRON TECHNOLOGY INC·Filed 1998·Granted Feb 29, 2000·23 cites·48 claims
Showing the top 50 of 85 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →