Inventor · disambiguated record
Willem Seine Christian Roelofs
Also filed as: ROELOFS WILLEM SEINE CHRISTIAN
10 granted patents·2 pending applications·17 citations·filing 2012–2023
84Inventor score
Top patents by PatentIndex Score
12 records- 0195US11774862B2Method of obtaining measurements, apparatus for performing a process step, and metrology apparatusASML NETHERLANDS BV·Filed 2021·Granted Oct 3, 2023·4 cites·20 claims
- 0294US10527958B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jan 7, 2020·7 cites·21 claims
- 0385US11029610B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jun 8, 2021·2 cites·21 claims
- 0481US11782349B2Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2023·Granted Oct 10, 2023·0 cites·20 claims
- 0579US10962887B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Mar 30, 2021·1 cites·20 claims
- 0677US11592753B2Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2022·Granted Feb 28, 2023·0 cites·20 claims
- 0777US11175591B2Method of obtaining measurements, apparatus for performing a process step, and metrology apparatusASML NETHERLANDS BV·Filed 2017·Granted Nov 16, 2021·2 cites·24 claims
- 0877US10877381B2Methods of determining corrections for a patterning processASML NETHERLANDS BV·Filed 2017·Granted Dec 29, 2020·1 cites·20 claims
- 0972US11327407B2Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted May 10, 2022·0 cites·20 claims
- 1052US11126093B2Focus and overlay improvement by modifying a patterning deviceASML NETHERLANDS BV·Filed 2017·Granted Sep 21, 2021·0 cites·20 claims
- 1138US2014090268A1Drying Device and Method for Drying a Pumpable MixtureROELOFS SEINE·Filed 2012·Application pending·0 cites
- 1237US2019294059A1Method of determining pellicle compensation corrections for a lithographic process, metrology apparatus and computer programASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Willem Seine Christian Roelofs files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →