Inventor · disambiguated record
Wolfgang Henke
Also filed as: HENKE WOLFGANG · HENKE WOLFGANG HELMUT
15 granted patents·2 pending applications·54 citations·filing 2001–2021
89Inventor score
Top patents by PatentIndex Score
17 records- 0196US10281825B2Method of sequencing lots for a lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted May 7, 2019·16 cites·20 claims
- 0289US7727837B2Method of producing an integrated circuit having a capacitor with a supporting layerQIMONDA AG·Filed 2007·Granted Jun 1, 2010·19 cites·25 claims
- 0381US8440475B2Alignment calculationHABETS BORIS·Filed 2008·Granted May 14, 2013·7 cites·15 claims
- 0480US11249404B2System and method for measurement of alignmentASML NETHERLANDS BV·Filed 2018·Granted Feb 15, 2022·2 cites·17 claims
- 0580US9715181B2Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2013·Granted Jul 25, 2017·3 cites·20 claims
- 0675US9971251B2Lithography system and a machine learning controller for such a lithography systemASML NETHERLANDS BV·Filed 2014·Granted May 15, 2018·2 cites·21 claims
- 0774US9507279B2Method of operating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2013·Granted Nov 29, 2016·2 cites·9 claims
- 0861US12493248B2Method for optimizing a sampling scheme and associated apparatusesASML NETHERLANDS BV·Filed 2021·Granted Dec 9, 2025·0 cites·20 claims
- 0954US11709434B2Device manufacturing methodASML NETHERLANDS BV·Filed 2020·Granted Jul 25, 2023·0 cites·20 claims
- 1047US10845719B2Methods for controlling lithographic apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Nov 24, 2020·0 cites·20 claims
- 1147US6620559B2Photomask, method of lithographically structuring a photoresist layer with the photomask, and method of producing magnetic memory elementsINFINEON TECHNOLOGIES AG·Filed 2001·Granted Sep 16, 2003·3 cites·10 claims
- 1245US10078273B2Lithographic apparatus with data processing apparatusASML NETHERLANDS BV·Filed 2014·Granted Sep 18, 2018·0 cites·20 claims
- 1344US10915689B2Method and apparatus to correct for patterning process errorASML NETHERLANDS BV·Filed 2016·Granted Feb 9, 2021·0 cites·21 claims
- 1442US2008204686A1Mask Structure for Manufacturing an Integrated Circuit by Photolithographic PatterningHENKE WOLFGANG·Filed 2008·Application pending·0 cites
- 1541US11150565B2Methods for controlling lithographic apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Oct 19, 2021·0 cites·20 claims
- 1641US7462426B2Method for producing a phase maskINFINEON TECHNOLOGIES AG·Filed 2005·Granted Dec 9, 2008·0 cites·15 claims
- 1736US2004027553A1Method for the characterization of an illumination source in an exposure apparatusFiled 2003·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Wolfgang Henke files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →