Inventor · disambiguated record
Wolfgang Singer
Also filed as: SINGER WOLFGANG
122 granted patents·30 pending applications·1,580 citations·filing 2000–2024
99Inventor score
Files withZEISS CARL SMT AG80ZEISS CARL SMT GMBH14ZEISS CARL MICROSCOPY GMBH10SHAFER DAVID5MAYO FOUND MEDICAL EDUCATION & RES4
Top patents by PatentIndex Score
152 records- 0199US6658084B2Illumination system with variable adjustment of the illuminationZEISS CARL SMT AG·Filed 2001·Granted Dec 2, 2003·179 cites·52 claims
- 0298US10191288B2Optical system and method for transmitting a source imageZEISS CARL AG·Filed 2018·Granted Jan 29, 2019·77 cites·20 claims
- 0398US6438199B1Illumination system particularly for microlithographyZEISS STIFTUNG·Filed 2000·Granted Aug 20, 2002·199 cites·65 claims
- 0495US7511886B2Optical beam transformation system and illumination system comprising an optical beam transformation systemZEISS CARL SMT AG·Filed 2005·Granted Mar 31, 2009·63 cites·54 claims
- 0594US10394032B2Optical system and method for transmitting a source imageZEISS CARL AG·Filed 2019·Granted Aug 27, 2019·14 cites·20 claims
- 0694US7977651B2Illumination system particularly for microlithographyZEISS CARL SMT GMBH·Filed 2009·Granted Jul 12, 2011·15 cites·20 claims
- 0794US7256932B2Optical system for ultraviolet lightZEISS CARL SMT AG·Filed 2005·Granted Aug 14, 2007·38 cites·32 claims
- 0893US7982854B2Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a systemZEISS CARL SMT GMBH·Filed 2006·Granted Jul 19, 2011·15 cites·12 claims
- 0993US7473907B2Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illuminationZEISS CARL SMT AG·Filed 2005·Granted Jan 6, 2009·26 cites·29 claims
- 1093US7196841B2Lighting system, particularly for use in extreme ultraviolet (EUV) lithographyZEISS CARL SMT AG·Filed 2003·Granted Mar 27, 2007·50 cites·27 claims
- 1193US6646718B2Projection objective having adjacently mounted aspheric lens surfacesZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Nov 11, 2003·49 cites·11 claims
- 1292US7321126B2Collector with fastening devices for fastening mirror shellsZEISS CARL SMT AG·Filed 2006·Granted Jan 22, 2008·26 cites·10 claims
- 1392US7244954B2Collector having unused region for illumination systems using a wavelength ≦193 nmZEISS CARL SMT AG·Filed 2005·Granted Jul 17, 2007·14 cites·27 claims
- 1491US8208199B2Catadioptric projection objectiveSHAFER DAVID·Filed 2009·Granted Jun 26, 2012·7 cites·20 claims
- 1591US7714983B2Illumination system for a microlithography projection exposure installationZEISS CARL SMT AG·Filed 2004·Granted May 11, 2010·38 cites·35 claims
- 1691US7466489B2Projection objective having a high aperture and a planar end surfaceBEDER SUSANNE·Filed 2005·Granted Dec 16, 2008·17 cites·98 claims
- 1791US7015489B2Collector having unused region for illumination systems using a wavelength less than or equal to 193 nmZEISS CARL SMT AG·Filed 2003·Granted Mar 21, 2006·36 cites·21 claims
- 1890US11723928B2Using autologous mesenchymal stem cells to treat multiple system atrophyMAYO FOUND MEDICAL EDUCATION & RES·Filed 2022·Granted Aug 15, 2023·1 cites·8 claims
- 1990US8208198B2Catadioptric projection objectiveSHAFER DAVID·Filed 2007·Granted Jun 26, 2012·8 cites·4 claims
- 2090US7428105B2Objectives as a microlithography projection objective with at least one liquid lensZEISS CARL SMT AG·Filed 2007·Granted Sep 23, 2008·9 cites·26 claims
- 2189US9804378B2Arrangement for light sheet microscopyZEISS CARL MICROSCOPY GMBH·Filed 2014·Granted Oct 31, 2017·11 cites·6 claims
- 2289US7684013B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 23, 2010·12 cites·15 claims
- 2388US7782440B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT AG·Filed 2005·Granted Aug 24, 2010·8 cites·4 claims
- 2488US7605386B2Optical device with raster elements, and illumination system with the optical deviceZEISS CARL SMT AG·Filed 2006·Granted Oct 20, 2009·21 cites·19 claims
- 2588US7116394B2Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning systemZEISS CARL SMT AG·Filed 2003·Granted Oct 3, 2006·31 cites·31 claims
- 2688US6859328B2Illumination system particularly for microlithographyCARL ZEISS SEMICONDUCTOR·Filed 2002·Granted Feb 22, 2005·58 cites·24 claims
- 2787US8705005B2Microlithographic illumination systemDEGUENTHER MARKUS·Filed 2008·Granted Apr 22, 2014·9 cites·49 claims
- 2886US7626770B2Illumination system with zoom objectiveZEISS CARL SMT AG·Filed 2007·Granted Dec 1, 2009·9 cites·32 claims
- 2986US7460212B2Collector configured of mirror shellsZEISS CARL SMT AG·Filed 2007·Granted Dec 2, 2008·11 cites·14 claims
- 3086US6964485B2Collector for an illumination system with a wavelength of less than or equal to 193 nmZEISS CARL SMT AG·Filed 2002·Granted Nov 15, 2005·24 cites·47 claims
- 3185US11426431B2Using autologous mesenchymal stem cells to treat multiple system atrophyMAYO FOUND MEDICAL EDUCATION & RES·Filed 2016·Granted Aug 30, 2022·2 cites·4 claims
- 3285US7348565B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2007·Granted Mar 25, 2008·10 cites·27 claims
- 3385US6806942B2Projection exposure systemZEISS CARL SMT AG·Filed 2003·Granted Oct 19, 2004·32 cites·39 claims
- 3484US8027088B2Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirrorZEISS CARL SMT GMBH·Filed 2007·Granted Sep 27, 2011·6 cites·32 claims
- 3584US7589903B2Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production methodZEISS CARL SMT AG·Filed 2006·Granted Sep 15, 2009·7 cites·51 claims
- 3684US7186983B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2004·Granted Mar 6, 2007·21 cites·21 claims
- 3783US7869138B2Projection objective and projection exposure apparatus with negative back focus of the entry pupilZEISS CARL SMT AG·Filed 2007·Granted Jan 11, 2011·7 cites·45 claims
- 3883US7319509B2Attenuator for attenuating wavelengths unequal to a used wavelengthZEISS CARL SMT AG·Filed 2005·Granted Jan 15, 2008·7 cites·23 claims
- 3982US12133869B2Using autologous mesenchymal stem cells to treat multiple system atrophyMAYO FOUND MEDICAL EDUCATION & RES·Filed 2023·Granted Nov 5, 2024·0 cites·4 claims
- 4082US8094380B2Projection objective and projection exposure apparatus with negative back focus of the entry pupilMANN HANS-JUERGEN·Filed 2010·Granted Jan 10, 2012·5 cites·25 claims
- 4182US7221516B2Projection lens for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted May 22, 2007·5 cites·21 claims
- 4282US6972841B2Method and apparatus for determining the non-volatile component of aerosol particles in a gas sampleAVL LIST GMBH·Filed 2002·Granted Dec 6, 2005·19 cites·22 claims
- 4382US2025017976A1Using autologous mesenchymal stem cells to treat multiple system atrophyMAYO FOUND MEDICAL EDUCATION & RES·Filed 2024·Application pending·0 cites
- 4480US7385764B2Objectives as a microlithography projection objective with at least one liquid lensZEISS CARL SMT AG·Filed 2004·Granted Jun 10, 2008·16 cites·24 claims
- 4580US7145637B2Illumination system having a more efficient collector opticZEISS CARL SMT AG·Filed 2005·Granted Dec 5, 2006·5 cites·18 claims
- 4679US7006595B2Illumination system particularly for microlithographyZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Feb 28, 2006·15 cites·22 claims
- 4779US6840640B2Multi mirror system for an illumination systemZEISS CARL SMT AG·Filed 2002·Granted Jan 11, 2005·18 cites·9 claims
- 4878US11163147B2Arrangement for microscopy and for correction of aberrationsZEISS CARL MICROSCOPY GMBH·Filed 2017·Granted Nov 2, 2021·3 cites·9 claims
- 4978US7583433B2Multi mirror system for an illumination systemZEISS CARL SMT AG·Filed 2004·Granted Sep 1, 2009·13 cites·25 claims
- 5078US7456408B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2008·Granted Nov 25, 2008·6 cites·14 claims
Showing the top 50 of 152 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →