Inventor · disambiguated record
Xin Sheng Guo
Also filed as: GUO XIN · GUO XIN S · GUO XIN SHENG
18 granted patents·2,954 citations·filing 1993–2010
97Inventor score
Top patents by PatentIndex Score
18 records- 0199US5558717ACVD Processing chamberAPPLIED MATERIALS INC·Filed 1994·Granted Sep 24, 1996·1.2k cites·36 claims
- 0298US6050506APattern of apertures in a showerhead for chemical vapor depositionAPPLIED MATERIALS INC·Filed 1998·Granted Apr 18, 2000·708 cites·14 claims
- 0396US5427666AMethod for in-situ cleaning a Ti target in a Ti + TiN coating processAPPLIED MATERIALS INC·Filed 1993·Granted Jun 27, 1995·104 cites·15 claims
- 0493US5885356AMethod of reducing residue accumulation in CVD chamber using ceramic liningAPPLIED MATERIALS INC·Filed 1995·Granted Mar 23, 1999·154 cites·22 claims
- 0593US5549802ACleaning of a PVD chamber containing a collimatorAPPLIED MATERIALS INC·Filed 1994·Granted Aug 27, 1996·73 cites·2 claims
- 0692US6191026B1Method for submicron gap filling on a semiconductor substrateAPPLIED MATERIALS INC·Filed 1996·Granted Feb 20, 2001·155 cites·19 claims
- 0789US5853607ACVD processing chamberAPPLIED MATERIALS INC·Filed 1995·Granted Dec 29, 1998·91 cites·5 claims
- 0888US5403459ACleaning of a PVD chamber containing a collimatorAPPLIED MATERIALS INC·Filed 1993·Granted Apr 4, 1995·45 cites·4 claims
- 0987US6251759B1Method and apparatus for depositing material upon a semiconductor wafer using a transition chamber of a multiple chamber semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1998·Granted Jun 26, 2001·88 cites·9 claims
- 1086US8179627B2Floating guard band for shingle magnetic recordingCHANG DAR-DER·Filed 2010·Granted May 15, 2012·35 cites·12 claims
- 1186US6374512B1Method for reducing contamination of a substrate in a substrate processing systemAPPLIED MATERIALS INC·Filed 2000·Granted Apr 23, 2002·32 cites·8 claims
- 1285US6410089B1Chemical vapor deposition of copper using profiled distribution of showerhead aperturesAPPLIED MATERIALS INC·Filed 2000·Granted Jun 25, 2002·23 cites·21 claims
- 1385US6096135AMethod and apparatus for reducing contamination of a substrate in a substrate processing systemAPPLIED MATERIALS INC·Filed 1998·Granted Aug 1, 2000·64 cites·8 claims
- 1485US5630917ACleaning of a PVD chamber containing a collimatorAPPLIED MATERIALS INC·Filed 1995·Granted May 20, 1997·51 cites·5 claims
- 1583US6296712B1Chemical vapor deposition hardware and processAPPLIED MATERIALS INC·Filed 1998·Granted Oct 2, 2001·68 cites·23 claims
- 1683US5538603AApparatus and process for increasing uniformity of sputtering rate in sputtering apparatusAPPLIED MATERIALS INC·Filed 1994·Granted Jul 23, 1996·42 cites·21 claims
- 1771US5607776AArticle formed by in-situ cleaning a Ti target in a Ti+TiN coating processAPPLIED MATERIALS INC·Filed 1995·Granted Mar 4, 1997·31 cites·10 claims
- 1863US5944899AInductively coupled plasma processing chamberAPPLIED MATERIALS INC·Filed 1996·Granted Aug 31, 1999·27 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →