Inventor · disambiguated record
Xing Lan Liu
Also filed as: Liu xing lan
18 granted patents·57 citations·filing 2014–2022
92Inventor score
Files withASML NETHERLANDS BV18
Top patents by PatentIndex Score
18 records- 0198US11204239B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2020·Granted Dec 21, 2021·7 cites·36 claims
- 0297US11428521B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2021·Granted Aug 30, 2022·3 cites·29 claims
- 0397US10718604B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2019·Granted Jul 21, 2020·6 cites·22 claims
- 0494US10990018B2Computational metrologyASML NETHERLANDS BV·Filed 2018·Granted Apr 27, 2021·10 cites·20 claims
- 0594US10386176B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2015·Granted Aug 20, 2019·5 cites·20 claims
- 0693US10474045B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 12, 2019·6 cites·20 claims
- 0793US10331043B2Optimization of target arrangement and associated targetASML NETHERLANDS BV·Filed 2015·Granted Jun 25, 2019·6 cites·20 claims
- 0891US11347150B2Computational metrologyASML NETHERLANDS BV·Filed 2021·Granted May 31, 2022·2 cites·22 claims
- 0987US9879988B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2016·Granted Jan 30, 2018·4 cites·20 claims
- 1082US12429328B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2022·Granted Sep 30, 2025·0 cites·20 claims
- 1182US11187995B2Metrology using a plurality of metrology target measurement recipesASML NETHERLANDS BV·Filed 2017·Granted Nov 30, 2021·2 cites·20 claims
- 1281US10025193B2Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2014·Granted Jul 17, 2018·3 cites·20 claims
- 1376US10788761B2Determining an optimal operational parameter setting of a metrology systemASML NETHERLANDS BV·Filed 2017·Granted Sep 29, 2020·1 cites·20 claims
- 1474US11493851B2Lithographic method and lithographic apparatusASML NETHERLANDS BV·Filed 2021·Granted Nov 8, 2022·0 cites·20 claims
- 1573US11156923B2Lithographic method and lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Oct 26, 2021·1 cites·20 claims
- 1672US10545410B2Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2017·Granted Jan 28, 2020·1 cites·20 claims
- 1771US12189302B2Computational metrologyASML NETHERLANDS BV·Filed 2022·Granted Jan 7, 2025·0 cites·22 claims
- 1869US11320750B2Determining an optimal operational parameter setting of a metrology systemASML NETHERLANDS BV·Filed 2020·Granted May 3, 2022·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →