Inventor · disambiguated record
Xingyue Peng
Also filed as: PENG XINGYUE
7 granted patents·9 pending applications·8 citations·filing 2007–2025
74Inventor score
Files withASML NETHERLANDS BV11PENG XINGYUE3ASML NETHERLAND BV1XIAMEN XINCHUANG BIOLOGICAL TECH CO LTD1
Top patents by PatentIndex Score
16 records- 0194US10990003B2Binarization method and freeform mask optimization flowASML NETHERLANDS BV·Filed 2019·Granted Apr 27, 2021·6 cites·20 claims
- 0281US2024419086A1Method of determining characteristic of patterning process based on defect for reducing hotspotASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 0370US2025138433A1Aberration impact systems, models, and manufacturing processesASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 0469US12222656B2Method for determining aberration sensitivity of patternsASML NETHERLANDS BV·Filed 2020·Granted Feb 11, 2025·0 cites·20 claims
- 0569US2025155824A1Method for determining aberration sensitivity of patternsASML NETHERLAND BV·Filed 2025·Application pending·0 cites
- 0667US12210291B2Aberration impact systems, models, and manufacturing processesASML NETHERLANDS BV·Filed 2021·Granted Jan 28, 2025·0 cites·20 claims
- 0766US12092963B2Method of determining characteristic of patterning process based on defect for reducing hotspotASML NETHERLANDS BV·Filed 2020·Granted Sep 17, 2024·0 cites·20 claims
- 0864US9328849B2Microdevice structure of microchannel chipPENG XINGYUE·Filed 2010·Granted May 3, 2016·2 cites·2 claims
- 0959US2025284190A1Determining mask rule check violations and mask design based on local feature dimensionASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1059US2024353749A1Methods, software, and systems for determination of constant-width sub-resolution assist featuresASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1156US2024241436A1Determining mask rule check violations and mask designASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1254US2023333483A1Optimization of scanner throughput and imaging quality for a patterning processASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1351US11899374B2Method for determining an electromagnetic field associated with a computational lithography mask modelASML NETHERLANDS BV·Filed 2019·Granted Feb 13, 2024·0 cites·20 claims
- 1451US2023313106A1Method for constructing slow microcyclic artificial cell niche and apparatus thereofPENG XINGYUE·Filed 2021·Application pending·0 cites
- 1540US2009322869A1Method for observing cells, chip and devicePENG XINGYUE·Filed 2007·Application pending·0 cites
- 1632US9446403B2Micro-channel chipXIAMEN XINCHUANG BIOLOGICAL TECH CO LTD·Filed 2012·Granted Sep 20, 2016·0 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →