Inventor · disambiguated record
Xiuhong Wei
Also filed as: WEI XIUHONG
7 granted patents·3 pending applications·45 citations·filing 2008–2025
82Inventor score
Files withASML NETHERLANDS BV5HUAWEI TECH CO LTD2ASML NETHERLANDS N V1MUSA SAMI1VAN DER SANDEN STEFAN CORNELIS THEODORUS1
Top patents by PatentIndex Score
10 records- 0192US9291916B2Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methodsASML NETHERLANDS BV·Filed 2015·Granted Mar 22, 2016·5 cites·12 claims
- 0292US8976355B2Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methodsVAN DER SANDEN STEFAN CORNELIS THEODORUS·Filed 2012·Granted Mar 10, 2015·19 cites·8 claims
- 0379US8982347B2Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatusASML NETHERLANDS N V·Filed 2012·Granted Mar 17, 2015·8 cites·17 claims
- 0479US8072615B2Alignment method, alignment system, and product with alignment markMUSA SAMI·Filed 2008·Granted Dec 6, 2011·11 cites·15 claims
- 0571US11669017B2Method for controlling a manufacturing apparatus and associated apparatusesASML NETHERLANDS BV·Filed 2018·Granted Jun 6, 2023·1 cites·20 claims
- 0671US11061336B2Device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Jul 13, 2021·1 cites·20 claims
- 0768US2025386358A1Communication method and apparatusHUAWEI TECH CO LTD·Filed 2025·Application pending·0 cites
- 0868US2025374251A1Resource pool determining method and apparatusHUAWEI TECH CO LTD·Filed 2025·Application pending·0 cites
- 0957US12306545B2Determining lithographic matching performanceASML NETHERLANDS BV·Filed 2020·Granted May 20, 2025·0 cites·20 claims
- 1036US2010245792A1Alignment Measurement Arrangement, Alignment Measurement Method, Device Manufacturing Method and Lithographic ApparatusASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Xiuhong Wei files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →