Inventor · disambiguated record
Xiawan Yang
Also filed as: YANG XIAWAN
9 granted patents·4 pending applications·56 citations·filing 1999–2023
83Inventor score
Files withAPPLIED MATERIALS INC8MICRON TECHNOLOGY INC2EXXONMOBIL CHEM PATENTS INC1SURFX TECHNOLOGIES LLC1TAYLOR TED1
Top patents by PatentIndex Score
13 records- 0185US7537994B2Methods of forming semiconductor devices, assemblies and constructionsMICRON TECHNOLOGY INC·Filed 2006·Granted May 26, 2009·12 cites·5 claims
- 0283US8791506B2Semiconductor devices, assemblies and constructionsTAYLOR TED·Filed 2011·Granted Jul 29, 2014·6 cites·12 claims
- 0369US6613708B1Catalyst selectivationEXXONMOBIL CHEM PATENTS INC·Filed 1999·Granted Sep 2, 2003·38 cites·11 claims
- 0456US12334358B2Integration processes utilizing boron-doped silicon materialsAPPLIED MATERIALS INC·Filed 2021·Granted Jun 17, 2025·0 cites·20 claims
- 0554US8044479B2Transistors, semiconductor devices, assemblies and constructionsMICRON TECHNOLOGY INC·Filed 2009·Granted Oct 25, 2011·0 cites·9 claims
- 0654US2025062131A1Plasma etching in semiconductor processingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0753US11437230B2Amorphous carbon multilayer coating with directional protectionAPPLIED MATERIALS INC·Filed 2020·Granted Sep 6, 2022·0 cites·20 claims
- 0852US11935751B2Boron nitride for mask patterningAPPLIED MATERIALS INC·Filed 2021·Granted Mar 19, 2024·0 cites·20 claims
- 0952US2025054770A1Methods of etching oxygen-containing features at low temperaturesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1052US2025054768A1Methods of etching carbon-containing features at low temperaturesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1144US9305748B2Method of matching two or more plasma reactorsAPPLIED MATERIALS INC·Filed 2013·Granted Apr 5, 2016·0 cites·13 claims
- 1242US2006156983A1Low temperature, atmospheric pressure plasma generation and applicationsSURFX TECHNOLOGIES LLC·Filed 2005·Application pending·0 cites
- 1338US9184021B2Predictive method of matching two plasma reactorsAPPLIED MATERIALS INC·Filed 2013·Granted Nov 10, 2015·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →