Inventor · disambiguated record
Yasuo Asada
Also filed as: ASADA YASUO
6 granted patents·5 pending applications·2 citations·filing 2018–2025
68Inventor score
Files withTOKYO ELECTRON LTD11
Top patents by PatentIndex Score
11 records- 0168US11342192B2Substrate processing method and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted May 24, 2022·1 cites·8 claims
- 0265US11189498B2Method of etching silicon-containing film, computer-readable storage medium, and apparatus for etching silicon-containing filmTOKYO ELECTRON LTD·Filed 2019·Granted Nov 30, 2021·1 cites·5 claims
- 0357US10665470B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2018·Granted May 26, 2020·0 cites·8 claims
- 0456US2020234974A1Etching Method and Etching ApparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 0554US2025391677A1Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0653US11784054B2Etching method and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Oct 10, 2023·0 cites·19 claims
- 0751US11011383B2Etching methodTOKYO ELECTRON LTD·Filed 2019·Granted May 18, 2021·0 cites·12 claims
- 0850US11373874B2Etching method and apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jun 28, 2022·0 cites·10 claims
- 0947US2023124597A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1042US2020098575A1Etching Method, Etching Apparatus, and Storage MediumTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1139US2019221440A1Etching Method and Etching ApparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →