Inventor · disambiguated record
Yasutomi Iwahashi
Also filed as: IWAHASHI YASUTOMI
15 granted patents·8 pending applications·188 citations·filing 2005–2020
93Inventor score
Top patents by PatentIndex Score
23 records- 0195US7462574B2Silica glass containing TiO2 and optical material for EUV lithographyASAHI GLASS CO LTD·Filed 2005·Granted Dec 9, 2008·25 cites·19 claims
- 0295US7429546B2Silica glass containing TiO2 and process for its productionASAHI GLASS CO LTD·Filed 2005·Granted Sep 30, 2008·29 cites·20 claims
- 0395US7419924B2Silica glass containing TiO2 and process for its productionASAHI GLASS CO LTD·Filed 2006·Granted Sep 2, 2008·21 cites·13 claims
- 0494US7538052B2Silica glass containing TiO2 and process for its productionASAHI GLASS CO LTD·Filed 2007·Granted May 26, 2009·23 cites·14 claims
- 0594US7294595B2Silica glassASAHI GLASS CO LTD·Filed 2006·Granted Nov 13, 2007·28 cites·20 claims
- 0693US7410922B2Silica glass containing TiO2 and process for its productionASAHI GLASS CO LTD·Filed 2005·Granted Aug 12, 2008·23 cites·8 claims
- 0792US7989378B2TiO2-containing silica glassASAHI GLASS CO LTD·Filed 2010·Granted Aug 2, 2011·15 cites·11 claims
- 0884US8093165B2TiO2-containing silica glass and optical member for EUV lithography using the sameKOIKE AKIO·Filed 2010·Granted Jan 10, 2012·8 cites·20 claims
- 0981US8034731B2TIO2-containing silica glass and optical member for lithography using the sameASAHI GLASS CO LTD·Filed 2010·Granted Oct 11, 2011·5 cites·10 claims
- 1075US8590342B2Method for producing TiO2-SiO2 glass body, method for heat-treating TiO2-SiO2 glass body, TiO2-SiO2 glass body, and optical base for EUVLKOIKE AKIO·Filed 2011·Granted Nov 26, 2013·4 cites·14 claims
- 1175US8356494B2Process for producing porous quartz glass object, and optical member for EUV lithographyASAHI GLASS CO LTD·Filed 2011·Granted Jan 22, 2013·2 cites·20 claims
- 1275US7998892B2TiO2-containing silica glass and optical member for lithography using the sameASAHI GLASS CO LTD·Filed 2010·Granted Aug 16, 2011·3 cites·19 claims
- 1373US8329604B2Silica glass containing TiO2 and process for its productionIWAHASHI YASUTOMI·Filed 2009·Granted Dec 11, 2012·2 cites·12 claims
- 1465US2009242387A1Process for producing silica glass containing tio2, and optical material for euv lithography employing silica glass containing tio2ASAHI GLASS CO LTD·Filed 2009·Application pending·0 cites
- 1562US11912617B2Silica glass for radio-frequency device and radio-frequency device technical fieldAGC INC·Filed 2020·Granted Feb 27, 2024·0 cites·10 claims
- 1658US2013276480A1Method for producing tio2-sio2 glass body, method for heat-treating tio2-sio2 glass body, tio2-sio2 glass body, and optical base for euvlASAHI GLASS CO LTD·Filed 2013·Application pending·0 cites
- 1756US2007207911A1Process for producing silica glass containing tio2, and optical material for euv lithography employing silica glass containing tio2ASAHI GLASS CO LTD·Filed 2007·Application pending·0 cites
- 1852US2012100341A1Method for producing tio2-sio2 glass body, method for heat-treating tio2-sio2 glass body, tio2-sio2 glass body, and optical base for euvlKOIKE AKIO·Filed 2011·Application pending·0 cites
- 1950US2011089612A1Tio2-containing quartz glass substrateASAHI GLASS CO LTD·Filed 2010·Application pending·0 cites
- 2049US2014335215A1Blank for nanoimprint mold, nanoimprint mold, and methods for producing said blank and said nanoimprint moldASAHI GLASS CO LTD·Filed 2014·Application pending·0 cites
- 2149US2010234205A1TiO2-containing quartz glass substrateASAHI GLASS CO LTD·Filed 2010·Application pending·0 cites
- 2241US8178450B2TiO2-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufactureKOIKE AKIO·Filed 2010·Granted May 15, 2012·0 cites·16 claims
- 2340US2012149543A1Tio2-containing silica glass, and optical member for euv lithographyKOIKE AKIO·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →