Inventor · disambiguated record
Yasushi Kamiya
Also filed as: KAMIYA YASUSHI
9 granted patents·1 pending application·25 citations·filing 2003–2016
82Inventor score
Top patents by PatentIndex Score
10 records- 0188US8378576B2Ion beam generatorCANON ANELVA CORP·Filed 2010·Granted Feb 19, 2013·12 cites·10 claims
- 0287US9564360B2Substrate processing method and method of manufacturing semiconductor deviceCANON ANELVA CORP·Filed 2016·Granted Feb 7, 2017·7 cites·17 claims
- 0375US9190287B2Method of fabricating fin FET and method of fabricating deviceCANON ANELVA CORP·Filed 2014·Granted Nov 17, 2015·3 cites·10 claims
- 0466US9966092B2Ion beam etching method and ion beam etching apparatusCANON ANELVA CORP·Filed 2016·Granted May 8, 2018·1 cites·5 claims
- 0563US9312102B2Apparatus and method for processing substrate using ion beamKAMIYA YASUSHI·Filed 2011·Granted Apr 12, 2016·2 cites·8 claims
- 0656US7704556B2Silicon nitride film forming methodCANON ANELVA CORP·Filed 2007·Granted Apr 27, 2010·0 cites·11 claims
- 0750US10062545B2Apparatus and method for processing substrate using ion beamCANON ANELVA CORP·Filed 2016·Granted Aug 28, 2018·0 cites·3 claims
- 0844US9422623B2Ion beam generator and ion beam plasma processing apparatusCANON ANELVA CORP·Filed 2014·Granted Aug 23, 2016·0 cites·6 claims
- 0938US2003198743A1Silicon nitride film forming apparatus and film forming methodFiled 2003·Application pending·0 cites
- 1032US9852879B2Ion beam processing method and ion beam processing apparatusCANON ANELVA CORP·Filed 2015·Granted Dec 26, 2017·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →