Inventor · disambiguated record
Yasuhiro Yoshii
Also filed as: YOSHII YASUHIRO
21 granted patents·4 pending applications·88 citations·filing 1992–2020
93Inventor score
Top patents by PatentIndex Score
25 records- 0190US8486605B2Positive resist composition and method of forming resist patternTAKESHITA MASARU·Filed 2010·Granted Jul 16, 2013·9 cites·8 claims
- 0288US8012669B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Sep 6, 2011·15 cites·8 claims
- 0385US7494762B2Positive resist composition for immersion lithography and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Feb 24, 2009·8 cites·8 claims
- 0484US8530598B2Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resinTAKESHITA MASARU·Filed 2012·Granted Sep 10, 2013·4 cites·6 claims
- 0584US8247161B2Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resinTAKESHITA MASARU·Filed 2009·Granted Aug 21, 2012·6 cites·8 claims
- 0683US11586111B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Feb 21, 2023·2 cites·4 claims
- 0783US11275306B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Mar 15, 2022·2 cites·4 claims
- 0873US11392033B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Jul 19, 2022·1 cites·4 claims
- 0973US8105747B2Positive resist composition and method of forming resist patternUTSUMI YOSHIYUKI·Filed 2007·Granted Jan 31, 2012·4 cites·10 claims
- 1068US8227169B2Compound, acid generator, resist composition, and method of forming resist patternKAWAUE AKIYA·Filed 2008·Granted Jul 24, 2012·2 cites·9 claims
- 1163US11822240B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2020·Granted Nov 21, 2023·0 cites·6 claims
- 1262US5383162ASemiconductor memory deviceHITACHI LTD·Filed 1992·Granted Jan 17, 1995·22 cites·28 claims
- 1361US8338075B2Positive resist composition and method of forming resist patternTAKESHITA MASARU·Filed 2009·Granted Dec 25, 2012·1 cites·9 claims
- 1461US7799507B2Positive resist composition for immersion lithography and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Sep 21, 2010·6 cites·16 claims
- 1558US9040220B2Compound and method of producing the same, acid generator, resist composition and method of forming resist patternHADA HIDEO·Filed 2012·Granted May 26, 2015·0 cites·17 claims
- 1657US2021200087A1Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2020·Application pending·0 cites
- 1752US2021200086A1Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2020·Application pending·0 cites
- 1852US2021165324A1Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2020·Application pending·0 cites
- 1948US11650497B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted May 16, 2023·0 cites·5 claims
- 2047US9034556B2Compound and method of producing the same, acid generator, resist composition and method of forming resist patternHADA HIDEO·Filed 2008·Granted May 19, 2015·2 cites·11 claims
- 2146US8900788B2Resist composition for immersion exposure and method of forming resist patternUTSUMI YOSHIYUKI·Filed 2007·Granted Dec 2, 2014·0 cites·9 claims
- 2246US6617021B2Adhesive composition and adhesive sheet for semiconductor devicesTOMOEGAWA PAPER CO INC·Filed 2002·Granted Sep 9, 2003·4 cites·9 claims
- 2346US2020150531A1Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2019·Application pending·0 cites
- 2443US11187981B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Nov 30, 2021·0 cites·3 claims
- 2535US8877432B2Method of forming resist pattern and resist compositionYOKOYA JIRO·Filed 2011·Granted Nov 4, 2014·0 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →