Inventor · disambiguated record
Yen-Wen Lu
Also filed as: LU YEN-WEN
68 granted patents·13 pending applications·1,028 citations·filing 1999–2025
99Inventor score
Top patents by PatentIndex Score
81 records- 0198US7120895B2System and method for lithography simulationBRION TECH INC·Filed 2005·Granted Oct 10, 2006·73 cites·28 claims
- 0298US7117478B2System and method for lithography simulationBRION TECH INC·Filed 2005·Granted Oct 3, 2006·61 cites·52 claims
- 0398US7003758B2System and method for lithography simulationBRION TECH INC·Filed 2004·Granted Feb 21, 2006·281 cites·35 claims
- 0497US7111277B2System and method for lithography simulationBRION TECH INC·Filed 2004·Granted Sep 19, 2006·65 cites·38 claims
- 0595US7114145B2System and method for lithography simulationBRION TECH INC·Filed 2004·Granted Sep 26, 2006·63 cites·54 claims
- 0694US9903823B2Metrology method and apparatusASML NETHERLANDS BV·Filed 2015·Granted Feb 27, 2018·10 cites·20 claims
- 0794US8739082B2Method of pattern selection for source and mask optimizationLIU HUA-YU·Filed 2010·Granted May 27, 2014·11 cites·7 claims
- 0893US11561477B2Training methods for machine learning assisted optical proximity error correctionASML NETHERLANDS BV·Filed 2018·Granted Jan 24, 2023·4 cites·20 claims
- 0993US10755025B2Process window identifierASML NETHERLANDS BV·Filed 2017·Granted Aug 25, 2020·7 cites·20 claims
- 1093US6476961B1Optical amplifier systems with transient controlONETTA INC·Filed 2001·Granted Nov 5, 2002·45 cites·17 claims
- 1192US8938699B2Multivariable solver for optical proximity correctionASML NETHERLANDS BV·Filed 2013·Granted Jan 20, 2015·6 cites·32 claims
- 1292US7117477B2System and method for lithography simulationBRION TECNOLOGIES INC·Filed 2004·Granted Oct 3, 2006·64 cites·55 claims
- 1392US6414788B1Optical amplifier system with transient controlONETTA INC·Filed 2000·Granted Jul 2, 2002·39 cites·26 claims
- 1491US9842186B2Process window identifierASML NETHERLANDS BV·Filed 2015·Granted Dec 12, 2017·11 cites·26 claims
- 1591US8560979B2Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured therebyWONG WILLIAM S·Filed 2012·Granted Oct 15, 2013·7 cites·15 claims
- 1690US12204250B2Training methods for machine learning assisted optical proximity errorASML NETHERLANDS BV·Filed 2023·Granted Jan 21, 2025·1 cites·20 claims
- 1789US11768440B2Training methods for machine learning assisted optical proximity error correctionASML NETHERLANDS BV·Filed 2022·Granted Sep 26, 2023·1 cites·11 claims
- 1889US11379648B2Process window identifierASML NETHERLANDS BV·Filed 2020·Granted Jul 5, 2022·2 cites·20 claims
- 1988US11232249B2Method for determining curvilinear patterns for patterning deviceASML NETHERLANDS BV·Filed 2019·Granted Jan 25, 2022·5 cites·20 claims
- 2088US8812998B2Method and apparatus for cost function based simultaneous OPC and SBAR optimizationTAO JUN·Filed 2012·Granted Aug 19, 2014·7 cites·21 claims
- 2188US8448099B2Multivariable solver for optical proximity correctionASML NETHERLANDS BV·Filed 2012·Granted May 21, 2013·4 cites·30 claims
- 2287US7873937B2System and method for lithography simulationASML NETHERLANDS BV·Filed 2006·Granted Jan 18, 2011·9 cites·35 claims
- 2386US11443083B2Identification of hot spots or defects by machine learningASML NETHERLANDS BV·Filed 2017·Granted Sep 13, 2022·2 cites·20 claims
- 2486US8893067B2System and method for lithography simulationASML NETHERLANDS BV·Filed 2013·Granted Nov 18, 2014·2 cites·18 claims
- 2585US8443312B2Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF)TSAI MIN-CHUN·Filed 2011·Granted May 14, 2013·13 cites·22 claims
- 2685US2025341785A1Identification of hot spots or defects by machine learningASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 2783US9619607B2Method and apparatus for cost function based simultaneous OPC and SBAR optimizationASML NETHERLANDS BV·Filed 2014·Granted Apr 11, 2017·7 cites·25 claims
- 2881US8239786B2Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured therebyWONG WILLIAM S·Filed 2009·Granted Aug 7, 2012·5 cites·20 claims
- 2981US8209640B2System and method for lithography simulationYE JUN·Filed 2010·Granted Jun 26, 2012·3 cites·20 claims
- 3080US11789371B2Methods of determining scattering of radiation by structures of finite thicknesses on a patterning deviceASML NETHERLANDS BV·Filed 2022·Granted Oct 17, 2023·0 cites·20 claims
- 3178US8826198B2Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF)ASML NETHERLANDS BV·Filed 2013·Granted Sep 2, 2014·4 cites·15 claims
- 3275US12360461B2Identification of hot spots or defects by machine learningASML NETHERLANDS BV·Filed 2022·Granted Jul 15, 2025·0 cites·20 claims
- 3374US11409203B2Methods of determining scattering of radiation by structures of finite thicknesses on a patterning deviceASML NETHERLANDS BV·Filed 2021·Granted Aug 9, 2022·0 cites·21 claims
- 3474US10996565B2Methods of determining scattering of radiation by structures of finite thicknesses on a patterning deviceASML NETHERLANDS BV·Filed 2018·Granted May 4, 2021·2 cites·20 claims
- 3574US10296681B2Process based metrology target designASML NETHERLANDS BV·Filed 2018·Granted May 21, 2019·1 cites·23 claims
- 3674US9418194B2Method and apparatus for model based flexible MRCASML NETHERLANDS BV·Filed 2014·Granted Aug 16, 2016·2 cites·16 claims
- 3774US6654489B2Apparatus and methods for collecting global data during a reticle inspectionKLA TENCOR TECH CORP·Filed 2002·Granted Nov 25, 2003·17 cites·31 claims
- 3873US10007744B2Process based metrology target designASML NETHERLANDS BV·Filed 2015·Granted Jun 26, 2018·2 cites·20 claims
- 3973US9080202B2Method of SNP detection by using gene detection technique in bead-based microfluidicsUNIV NAT TAIWAN·Filed 2014·Granted Jul 14, 2015·1 cites·12 claims
- 4072USD677265SDisplay with triangle-slide folding standLU YEN WEN·Filed 2012·Granted Mar 5, 2013·20 cites·1 claims
- 4171US11734490B2Method for determining curvilinear patterns for patterning deviceASML NETHERLANDS BV·Filed 2021·Granted Aug 22, 2023·0 cites·22 claims
- 4269USD653254SDisplay screenLU YEN WEN·Filed 2011·Granted Jan 31, 2012·18 cites·1 claims
- 4368US7167185B1Visualization of photomask databasesKLA TENCOR TECH CORP·Filed 2003·Granted Jan 23, 2007·9 cites·9 claims
- 4468US6707599B1Optical network equipment with triggered data storageONETTA INC·Filed 2001·Granted Mar 16, 2004·13 cites·7 claims
- 4567US10948831B2Methods of determining process models by machine learningASML NETHERLANDS BV·Filed 2018·Granted Mar 16, 2021·1 cites·22 claims
- 4665US6782199B1Optical communications systems with optical subsystem communications linksONETTA INC·Filed 2000·Granted Aug 24, 2004·8 cites·18 claims
- 4763US6516085B1Apparatus and methods for collecting global data during a reticle inspectionKLA TENCOR·Filed 1999·Granted Feb 4, 2003·30 cites·29 claims
- 4863US2021271172A1Methods of determining process models by machine learningASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 4962USD677264SDisplay with butterfly folding standLU YEN WEN·Filed 2012·Granted Mar 5, 2013·13 cites·1 claims
- 5061US11016395B2Methods of determining scattering of radiation by structures of finite thicknesses on a patterning deviceASML NETHERLANDS BV·Filed 2017·Granted May 25, 2021·0 cites·22 claims
Showing the top 50 of 81 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →