Inventor · disambiguated record
Yiwen Fan
Also filed as: FAN YIWEN
7 granted patents·5 pending applications·19 citations·filing 2020–2025
79Inventor score
Files withLAM RES CORP12
Top patents by PatentIndex Score
12 records- 0197US12105422B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2020·Granted Oct 1, 2024·13 cites·12 claims
- 0295US12510825B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2024·Granted Dec 30, 2025·2 cites·33 claims
- 0395US12510826B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2024·Granted Dec 30, 2025·2 cites·12 claims
- 0488US11935758B2Atomic layer etching for subtractive metal etchLAM RES CORP·Filed 2020·Granted Mar 19, 2024·2 cites·7 claims
- 0581US12266542B2Atomic layer etching for subtractive metal etchLAM RES CORP·Filed 2024·Granted Apr 1, 2025·0 cites·9 claims
- 0672US2025191934A1Atomic layer etching for subtractive metal etchLAM RES CORP·Filed 2025·Application pending·0 cites
- 0766US12417902B2Method for cleaning a chamberLAM RES CORP·Filed 2021·Granted Sep 16, 2025·0 cites·22 claims
- 0854US2025218774A1High energy atomic layer etch of a carbon containing layerLAM RES CORP·Filed 2023·Application pending·0 cites
- 0954US2025210363A1Fast atomic layer etchLAM RES CORP·Filed 2023·Application pending·0 cites
- 1050US2025243585A1Co-deposition and etch processLAM RES CORP·Filed 2023·Application pending·0 cites
- 1149US2024021435A1Metal etchLAM RES CORP·Filed 2021·Application pending·0 cites
- 1245US12256645B2Chemical etch nonvolatile materials for MRAM patterningLAM RES CORP·Filed 2020·Granted Mar 18, 2025·0 cites·23 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →