Inventor · disambiguated record
Yixing Lin
Also filed as: LIN YIXING
16 granted patents·5 pending applications·376 citations·filing 2002–2023
94Inventor score
Files withAPPLIED MATERIALS INC20
Top patents by PatentIndex Score
21 records- 0196US6776873B1Yttrium oxide based surface coating for semiconductor IC processing vacuum chambersFiled 2002·Granted Aug 17, 2004·153 cites·6 claims
- 0295US6565984B1Clean aluminum alloy for semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 2002·Granted May 20, 2003·70 cites·24 claims
- 0389US10583465B230 nm in-line LPC testing and cleaning of semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Mar 10, 2020·4 cites·9 claims
- 0489US8021743B2Process chamber component with layered coating and methodAPPLIED MATERIALS INC·Filed 2009·Granted Sep 20, 2011·17 cites·36 claims
- 0588US6713188B2Clean aluminum alloy for semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 2003·Granted Mar 30, 2004·27 cites·33 claims
- 0687US11866821B2Substrate support cover for high-temperature corrosive environmentAPPLIED MATERIALS INC·Filed 2020·Granted Jan 9, 2024·2 cites·10 claims
- 0786US6659331B2Plasma-resistant, welded aluminum structures for use in semiconductor apparatusAPPLIED MATERIALS INC·Filed 2002·Granted Dec 9, 2003·30 cites·36 claims
- 0883US7048814B2Halogen-resistant, anodized aluminum for use in semiconductor processing apparatusAPPLIED MATERIALS INC·Filed 2002·Granted May 23, 2006·16 cites·4 claims
- 0981US7910218B2Cleaning and refurbishing chamber components having metal coatingsAPPLIED MATERIALS INC·Filed 2003·Granted Mar 22, 2011·25 cites·23 claims
- 1079US7579067B2Process chamber component with layered coating and methodAPPLIED MATERIALS INC·Filed 2004·Granted Aug 25, 2009·18 cites·33 claims
- 1169US11047035B2Protective yttria coating for semiconductor equipment partsAPPLIED MATERIALS INC·Filed 2019·Granted Jun 29, 2021·1 cites·19 claims
- 1268US10233554B2Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Mar 19, 2019·1 cites·19 claims
- 1363US2025073819A1Laser Cleaning Used Component of Substrate Processing ChamberAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1462US7033447B2Halogen-resistant, anodized aluminum for use in semiconductor processing apparatusAPPLIED MATERIALS INC·Filed 2002·Granted Apr 25, 2006·8 cites·2 claims
- 1558US2025201527A1High Conformal Coating on Textured Surface of Processing Chamber ComponentAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1654US10253406B2Method for forming yttrium oxide on semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Apr 9, 2019·0 cites·19 claims
- 1754US7055732B2Semiconductor processing apparatus including plasma-resistant, welded aluminum structuresAPPLIED MATERIALS INC·Filed 2003·Granted Jun 6, 2006·4 cites·23 claims
- 1854US2008213496A1Method of coating semiconductor processing apparatus with protective yttrium-containing coatingsAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 1944US11898245B2High throughput and metal contamination control oven for chamber component cleaning processAPPLIED MATERIALS INC·Filed 2021·Granted Feb 13, 2024·0 cites·15 claims
- 2037US2005238807A1Refurbishment of a coated chamber componentAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 2136US2003188685A1Laser drilled surfaces for substrate processing chambersAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →