Inventor · disambiguated record
Yiqiong Wang
Also filed as: WANG YIQIONG
4 granted patents·6 pending applications·234 citations·filing 1997–2002
82Inventor score
Files withAPPLIED MATERIALS INC3
Top patents by PatentIndex Score
10 records- 0191US6380095B1Silicon trench etch using silicon-containing precursors to reduce or avoid mask erosionAPPLIED MATERIALS INC·Filed 2000·Granted Apr 30, 2002·66 cites·21 claims
- 0287US6127278AEtch process for forming high aspect ratio trenched in siliconAPPLIED MATERIALS INC·Filed 1997·Granted Oct 3, 2000·103 cites·23 claims
- 0386US6827869B2Method of micromachining a multi-part cavityFiled 2002·Granted Dec 7, 2004·43 cites·21 claims
- 0478US6593244B1Process for etching conductors at high etch ratesAPPLIED MATERIALS INC·Filed 2000·Granted Jul 15, 2003·22 cites·13 claims
- 0537US2002158046A1Formation of an optical componentFiled 2001·Application pending·0 cites
- 0636US2003098289A1Forming an optical mode transformerFiled 2001·Application pending·0 cites
- 0735US2002158045A1Formation of an optical component having smooth sidewallsFiled 2001·Application pending·0 cites
- 0834US2003003748A1Method of eliminating notching when anisotropically etching small linewidth openings in silicon on insulatorFiled 2001·Application pending·0 cites
- 0934US2001045354A1Method of etching high aspect ratio openings in siliconFiled 2001·Application pending·0 cites
- 1034US2002158047A1Formation of an optical component having smooth sidewallsFiled 2002·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Yiqiong Wang files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →