Inventor · disambiguated record
Youn-Jin Cho
Also filed as: CHO YOUN-JIN
21 granted patents·6 pending applications·29 citations·filing 2008–2022
91Inventor score
Top patents by PatentIndex Score
27 records- 0185US9158201B2Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask compositionLEE BUM-JIN·Filed 2013·Granted Oct 13, 2015·4 cites·15 claims
- 0283US9556094B2Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask compositionCHEIL IND INC·Filed 2013·Granted Jan 31, 2017·6 cites·15 claims
- 0381US8997925B2High temperature resistant sound absorbing materials for vehicleHYUNDAI MOTOR CO LTD·Filed 2013·Granted Apr 7, 2015·3 cites·10 claims
- 0481US8952373B2Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patternsCHOI YOO-JEONG·Filed 2013·Granted Feb 10, 2015·6 cites·15 claims
- 0575US10093830B2Composition for forming a silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layerSAMSUNG SDI CO LTD·Filed 2015·Granted Oct 9, 2018·1 cites·13 claims
- 0675US7993810B2(Meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methodsCHEIL IND INC·Filed 2008·Granted Aug 9, 2011·2 cites·15 claims
- 0771US9725389B2Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask compositionCHEIL IND INC·Filed 2012·Granted Aug 8, 2017·2 cites·12 claims
- 0866US9359276B2Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask compositionCHOI YOO-JEONG·Filed 2012·Granted Jun 7, 2016·1 cites·10 claims
- 0966US9244351B2Composition for hardmask, method of forming patterns using the same, and semiconductor integrated circuit device including the patternsLEE SUNG-JAE·Filed 2012·Granted Jan 26, 2016·2 cites·12 claims
- 1065US9529257B2Hard mask composition and method for forming pattern using sameCHEIL IND INC·Filed 2013·Granted Dec 27, 2016·1 cites·15 claims
- 1163US9513546B2Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask compositionCHEIL IND INC·Filed 2013·Granted Dec 6, 2016·1 cites·13 claims
- 1254US2015093545A1Composition for a silica based layer, silica based layer, and method of manufacturing a silica based layerSAMSUNG SDI CO LTD·Filed 2014·Application pending·0 cites
- 1352US9823566B2Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask compositionCHEIL IND INC·Filed 2013·Granted Nov 21, 2017·0 cites·20 claims
- 1450US8017301B2Photosensitive polymer, resist composition, and associated methodsCHEIL IND INC·Filed 2008·Granted Sep 13, 2011·0 cites·15 claims
- 1549US2017327640A1Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2017·Application pending·0 cites
- 1648US9284245B2Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask compositionLEE SUNG-JAE·Filed 2013·Granted Mar 15, 2016·0 cites·16 claims
- 1746US11560495B2CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the sameSAMSUNG SDI CO LTD·Filed 2021·Granted Jan 24, 2023·0 cites·9 claims
- 1846US9902873B2Composition for forming silica based layer, and method for manufacturing silica based layerSAMSUNG SDI CO LTD·Filed 2014·Granted Feb 27, 2018·0 cites·10 claims
- 1946US2009155719A1Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methodsCHOI SANG-JUN·Filed 2008·Application pending·0 cites
- 2046US2023227695A1Compound, cmp slurry composition including the same and polishing method using the sameSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 2142US12139642B2CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the sameSAMSUNG SDI CO LTD·Filed 2021·Granted Nov 12, 2024·0 cites·8 claims
- 2242US9671688B2Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask compositionCHEIL IND INC·Filed 2013·Granted Jun 6, 2017·0 cites·12 claims
- 2340US11608471B2Composition for etching silicon nitride film and etching method using sameSAMSUNG SDI CO LTD·Filed 2019·Granted Mar 21, 2023·0 cites·16 claims
- 2436US9312122B2Rinse liquid for insulating film and method of rinsing insulating filmBAE JIN-HEE·Filed 2013·Granted Apr 12, 2016·0 cites·11 claims
- 2536US8900997B2Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewithMOON JOON-YOUNG·Filed 2013·Granted Dec 2, 2014·0 cites·8 claims
- 2635US2010239982A1Photoresist composition with high etching resistanceCHEIL IND INC·Filed 2010·Application pending·0 cites
- 2734US2010233620A1Copolymer and photoresist composition including the sameCHOI SANG-JUN·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →