Inventor · disambiguated record
Yoo-Jeong Choi
Also filed as: CHOI YOO-JEONG
14 granted patents·2 pending applications·49 citations·filing 2011–2017
88Inventor score
Top patents by PatentIndex Score
16 records- 0191US9018776B2Hardmask composition including aromatic ring-containing compound, method of forming patterns, and semiconductor integrated circuit device including the patternsSONG JEE-YUN·Filed 2011·Granted Apr 28, 2015·20 cites·12 claims
- 0284US9971243B2Polymer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2016·Granted May 15, 2018·2 cites·15 claims
- 0383US9556094B2Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask compositionCHEIL IND INC·Filed 2013·Granted Jan 31, 2017·6 cites·15 claims
- 0481US8952373B2Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patternsCHOI YOO-JEONG·Filed 2013·Granted Feb 10, 2015·6 cites·15 claims
- 0579US8741539B2Hardmask composition, method of forming a pattern using the same, and semiconductor integrated circuit device including the patternOH SEUNG-BAE·Filed 2011·Granted Jun 3, 2014·7 cites·16 claims
- 0676US10066057B2Organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Sep 4, 2018·2 cites·20 claims
- 0776US9665003B2Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsCHOI YOO-JEONG·Filed 2014·Granted May 30, 2017·3 cites·18 claims
- 0871US9725389B2Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask compositionCHEIL IND INC·Filed 2012·Granted Aug 8, 2017·2 cites·12 claims
- 0966US9359276B2Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask compositionCHOI YOO-JEONG·Filed 2012·Granted Jun 7, 2016·1 cites·10 claims
- 1049US2017327640A1Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2017·Application pending·0 cites
- 1142US9671688B2Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask compositionCHEIL IND INC·Filed 2013·Granted Jun 6, 2017·0 cites·12 claims
- 1242US2015187566A1Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsSAMSUNG SDI CO LTD·Filed 2014·Application pending·0 cites
- 1338US10345706B2Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask compositionSONG HYUN JI·Filed 2014·Granted Jul 9, 2019·0 cites·10 claims
- 1438US10332751B2Monomer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 25, 2019·0 cites·15 claims
- 1534US9371444B2Hardmask composition and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 21, 2016·0 cites·14 claims
- 1632US10018914B2Hardmask composition and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2015·Granted Jul 10, 2018·0 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →