Inventor · disambiguated record
Yoshiki Igarashi
Also filed as: IGARASHI YOSHIKI
15 granted patents·7 pending applications·321 citations·filing 1988–2023
93Inventor score
Top patents by PatentIndex Score
22 records- 0196US10707090B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2018·Granted Jul 7, 2020·41 cites·20 claims
- 0296US9666446B2Etching methodTOKYO ELECTRON LTD·Filed 2016·Granted May 30, 2017·43 cites·13 claims
- 0394US8128831B2Plasma etching method and computer-readable storage mediumSATO MANABU·Filed 2006·Granted Mar 6, 2012·50 cites·16 claims
- 0491USD347063SMagnetic resonance imaging scannerHITACHI LTD·Filed 1992·Granted May 17, 1994·47 cites·1 claims
- 0584US5256969AGradient magnetic field coil for magnetic resonance imaging systemHITACHI LTD·Filed 1990·Granted Oct 26, 1993·60 cites·15 claims
- 0683US9966273B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2016·Granted May 8, 2018·3 cites·8 claims
- 0769US8518830B2Plasma etching method and storage mediumIGARASHI YOSHIKI·Filed 2012·Granted Aug 27, 2013·3 cites·8 claims
- 0868US12381096B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Aug 5, 2025·0 cites·6 claims
- 0964US9418863B2Method for etching etching target layerTOKYO ELECTRON LTD·Filed 2015·Granted Aug 16, 2016·1 cites·10 claims
- 1064US9312105B2Method for etching insulation filmTOKYO ELECTRON LTD·Filed 2015·Granted Apr 12, 2016·1 cites·4 claims
- 1163US11791175B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Oct 17, 2023·0 cites·13 claims
- 1263US8404595B2Plasma processing methodHONDA MASANOBU·Filed 2007·Granted Mar 26, 2013·1 cites·6 claims
- 1358US7465673B2Method and apparatus for bilayer photoresist dry developmentTOKYO ELECTRON LTD·Filed 2003·Granted Dec 16, 2008·7 cites·14 claims
- 1455US4903703AConversation device of MR imaging apparatusHITACHI LTD·Filed 1988·Granted Feb 27, 1990·52 cites·8 claims
- 1551US2013213572A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1646US5189372ASilencer for magnetic field gradient coils in a magnetic resonance imaging apparatusHITACHI LTD·Filed 1991·Granted Feb 23, 1993·12 cites·5 claims
- 1739US2005106875A1Plasma ashing methodTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1837US2004173573A1Oxide film etching methodTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1936US2004106293A1Method for etching organic insulating film and dual damasene processFiled 2002·Application pending·0 cites
- 2036US2005269294A1Etching methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 2134US2013023120A1Method of forming mask pattern and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2011·Application pending·0 cites
- 2232US2002055263A1Oxide film etching methodFiled 2001·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Yoshiki Igarashi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →