Inventor · disambiguated record
Yool Kang
Also filed as: KANG YOOL
27 granted patents·10 pending applications·180 citations·filing 1998–2023
95Inventor score
Top patents by PatentIndex Score
37 records- 0192US6485895B1Methods for forming line patterns in semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Nov 26, 2002·55 cites·25 claims
- 0282US7560768B2Nonvolatile memory device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jul 14, 2009·8 cites·8 claims
- 0380US8173358B2Method of forming fine patterns of a semiconductor deviceKIM HYOUNG-HEE·Filed 2009·Granted May 8, 2012·9 cites·20 claims
- 0479US9892915B2Hard mask composition, carbon nanotube layer structure, pattern forming method, and manufacturing method of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Feb 13, 2018·3 cites·13 claims
- 0578US8623739B2Method of manufacturing semiconductor device using acid diffusionLEE HYUNG-RAE·Filed 2011·Granted Jan 7, 2014·7 cites·5 claims
- 0678US7862988B2Method for forming patterns of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jan 4, 2011·6 cites·21 claims
- 0778US6803176B2Methods for forming line patterns in semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Oct 12, 2004·17 cites·48 claims
- 0877US8778598B2Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusionSAMSUNG ELECTRONICS CO LTD·Filed 2012·Granted Jul 15, 2014·3 cites·10 claims
- 0977US6753125B2Photosensitive polymer having fused aromatic ring and photoresist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Jun 22, 2004·14 cites·25 claims
- 1072US8431331B2Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusionKANG YOOL·Filed 2008·Granted Apr 30, 2013·4 cites·20 claims
- 1169US7678650B2Nonvolatile memory device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Mar 16, 2010·3 cites·14 claims
- 1268US8227349B2Method of forming a mask pattern, method of forming a minute pattern, and method of manufacturing a semiconductor device using the sameKIM HYOUNG-HEE·Filed 2010·Granted Jul 24, 2012·3 cites·20 claims
- 1367US6300036B1Photosensitive polymers and chemically amplified photoresist compositions using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Oct 9, 2001·13 cites·13 claims
- 1464US8314036B2Methods of forming fine patterns of semiconductor deviceMOON SEONGHO·Filed 2010·Granted Nov 20, 2012·3 cites·20 claims
- 1562US6280903B1Chemically amplified resist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Aug 28, 2001·5 cites·8 claims
- 1660US6787287B2Photosensitive polymers and resist compositions comprising the photosensitive polymersSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Sep 7, 2004·5 cites·21 claims
- 1758US2024319593A1Thinner composition and method of treating surface of semiconductor substrate by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1851US6284438B1Method for manufacturing a photoresist pattern defining a small opening and method for manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Sep 4, 2001·16 cites·21 claims
- 1947US11189491B2Method of forming mask pattern and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Nov 30, 2021·0 cites·20 claims
- 2045US8536347B2Photoacid generator, chemically amplified resist composition including the same, and associated methodsKANG YOOL·Filed 2008·Granted Sep 17, 2013·0 cites·9 claims
- 2144US9337032B2Method of forming pattern of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted May 10, 2016·0 cites·19 claims
- 2244US8987118B2Method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Mar 24, 2015·0 cites·16 claims
- 2344US7842450B2Method of forming a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Nov 30, 2010·0 cites·18 claims
- 2444US2008076070A1Methods of Forming Fine Patterns In Integrated Circuits Using Atomic Layer DepositionSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2543US10236185B2Method of forming patterns for semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Mar 19, 2019·0 cites·20 claims
- 2643US8735053B2Methods of forming photoresist patternsMAYYA SUBRAMANYA·Filed 2011·Granted May 27, 2014·0 cites·18 claims
- 2743US2005026078A1Resist compositions including thermal crosslinking agentsFiled 2004·Application pending·0 cites
- 2842US6114084AChemically amplified resist compositionSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Sep 5, 2000·6 cites·6 claims
- 2941US2006115772A1Polymeric tetrahedral carbon films, methods of forming the same and methods of forming fine patterns using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 3041US2006111547A1Bottom layer resist polymers for photolithography and methods of manufacturing the sameHATA MITSUHIRO·Filed 2005·Application pending·0 cites
- 3141US2006127816A1Double photolithography methods with reduced intermixing of solventsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 3238US2013034965A1Methods of forming fine patterns using dry etch-back processesSAMSUNG ELECTRONICS CO LTD·Filed 2012·Application pending·0 cites
- 3337US10712662B2Methods of forming patterns using compositions for an underlayer of photoresistSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jul 14, 2020·0 cites·14 claims
- 3437US9613821B2Method of forming patterns and method of manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Apr 4, 2017·0 cites·65 claims
- 3537US2006160028A1Method of forming fine patterns of a semiconductor deviceLEE HYUNG-RAE·Filed 2006·Application pending·0 cites
- 3636US2011244689A1Method of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2011·Application pending·0 cites
- 3736US2013040448A1Methods of forming metal or metal nitride patterns and methods of manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2012·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Yool Kang files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →