Inventor · disambiguated record
Yoshiki Kida
Also filed as: KIDA YOSHIKI
12 granted patents·4 pending applications·242 citations·filing 1999–2024
91Inventor score
Top patents by PatentIndex Score
16 records- 0196US6400445B2Method and apparatus for positioning substrateNIKON CORP·Filed 2001·Granted Jun 4, 2002·87 cites·14 claims
- 0294US6225012B1Method for positioning substrateNIKON CORP·Filed 2000·Granted May 1, 2001·57 cites·32 claims
- 0390US6577382B2Substrate transport apparatus and methodNIKON CORP·Filed 2002·Granted Jun 10, 2003·55 cites·4 claims
- 0474US9239524B2Exposure condition determination method, exposure method, exposure apparatus, and device manufacturing method involving detection of the situation of a liquid immersion regionKIDA YOSHIKI·Filed 2006·Granted Jan 19, 2016·4 cites·48 claims
- 0569US8035799B2Exposure apparatus, exposure method, and device producing methodNIKON CORP·Filed 2005·Granted Oct 11, 2011·2 cites·40 claims
- 0666US7872476B2NMR probeJEOL LTD·Filed 2009·Granted Jan 18, 2011·5 cites·11 claims
- 0765US6900880B2Exposure apparatus, surface position adjustment unit, mask, and device manufacturing methodNIKON CORP·Filed 2003·Granted May 31, 2005·9 cites·29 claims
- 0864US9025126B2Exposure apparatus adjusting method, exposure apparatus, and device fabricating methodSHIRATA YOSUKE·Filed 2008·Granted May 5, 2015·2 cites·34 claims
- 0960US6141108APosition control method in exposure apparatusNIKON CORP·Filed 1999·Granted Oct 31, 2000·20 cites·23 claims
- 1060US2024377763A1First holding apparatus, third holding apparatus, fifth holding apparatus, transport system, exposure system, exposure method, and device manufacturing methodNIKON CORP·Filed 2024·Application pending·0 cites
- 1151US8913224B2Exposure apparatus, exposure method, and device producing methodKIDA YOSHIKI·Filed 2011·Granted Dec 16, 2014·0 cites·23 claims
- 1251US2016124317A1Exposure condition determination method, exposure method, exposure apparatus, and device manufacturing method involving detection of the situation of a liquid immersion regionNIKON CORP·Filed 2015·Application pending·0 cites
- 1348US7714579B2NMR probeJEOL LTD·Filed 2008·Granted May 11, 2010·1 cites·14 claims
- 1442US2009135382A1Exposure method, exposure apparatus, and method for producing deviceNIKON CORP·Filed 2006·Application pending·0 cites
- 1537US2002003216A1Exposure apparatus, surface position adjustment unit, mask, and device manufacturing methodNIKON CORP·Filed 2001·Application pending·0 cites
- 1635US6680611B2Local signal-supplying device for NMR spectrometerJEOL LTD·Filed 2002·Granted Jan 20, 2004·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →