Inventor · disambiguated record
Yoshimitsu Kodaira
Also filed as: KODAIRA YOSHIMITSU
13 granted patents·6 pending applications·76 citations·filing 2004–2018
88Inventor score
Top patents by PatentIndex Score
19 records- 0191USRE40951EDry etching method for magnetic materialCANON ANELVA CORP·Filed 2008·Granted Nov 10, 2009·23 cites·25 claims
- 0287US7060194B2Dry etching method for magnetic materialANELVA CORP·Filed 2004·Granted Jun 13, 2006·42 cites·19 claims
- 0375US9734989B2Method for manufacturing semiconductor device, ion beam etching device, and control deviceCANON ANELVA CORP·Filed 2013·Granted Aug 15, 2017·3 cites·18 claims
- 0475US9190287B2Method of fabricating fin FET and method of fabricating deviceCANON ANELVA CORP·Filed 2014·Granted Nov 17, 2015·3 cites·10 claims
- 0570US10026591B2Method for manufacturing semiconductor device, ion beam etching device, and control deviceCANON ANELVA CORP·Filed 2017·Granted Jul 17, 2018·1 cites·3 claims
- 0669US8540852B2Method and apparatus for manufacturing magnetoresistive devicesWATANABE NAOKI·Filed 2006·Granted Sep 24, 2013·3 cites·6 claims
- 0760US7981805B2Method for manufacturing resistance change elementCANON ANELVA CORP·Filed 2010·Granted Jul 19, 2011·1 cites·9 claims
- 0853US10546720B2Ion beam processing deviceCANON ANELVA CORP·Filed 2018·Granted Jan 28, 2020·0 cites·5 claims
- 0953US9984854B2Ion beam processing method and ion beam processing apparatusCANON ANELVA CORP·Filed 2014·Granted May 29, 2018·0 cites·9 claims
- 1047US2010044340A1Method of fabricating magnetic deviceCANON ANELVA CORP·Filed 2009·Application pending·0 cites
- 1146US9640754B2Process for producing magnetoresistive effect elementCANON ANELVA CORP·Filed 2013·Granted May 2, 2017·0 cites·13 claims
- 1242US9773973B2Process for producing magnetoresistive effect element and device producing methodCANON ANELVA CORP·Filed 2013·Granted Sep 26, 2017·0 cites·12 claims
- 1342US2009078569A1Inductively coupled plasma processing apparatusCANON ANELVA CORP·Filed 2008·Application pending·0 cites
- 1441US10388491B2Ion beam etching method of magnetic film and ion beam etching apparatusCANON ANELVA CORP·Filed 2012·Granted Aug 20, 2019·0 cites·6 claims
- 1535US2010310902A1Dry etching method, magneto-resistive element, and method and apparatus for manufacturing the sameCANON ANELVA CORP·Filed 2010·Application pending·0 cites
- 1635US2016351377A1Ion beam etching apparatus and ion beam generatorCANON ANELVA CORP·Filed 2016·Application pending·0 cites
- 1733US2010301008A1Process and apparatus for fabricating magnetic deviceCANON ANELVA CORP·Filed 2010·Application pending·0 cites
- 1832US2010304504A1Process and apparatus for fabricating magnetic deviceCANON ANELVA CORP·Filed 2009·Application pending·0 cites
- 1928US10685815B2Plasma processing apparatus and device manufacturing methodMATSUHASHI RYO·Filed 2010·Granted Jun 16, 2020·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →