Inventor · disambiguated record
Yoshihiro Kubota
Also filed as: KUBOTA YOSHIHIRO
135 granted patents·42 pending applications·1,445 citations·filing 1982–2024
99Inventor score
Top patents by PatentIndex Score
177 records- 0195US8518612B2Pellicle for lithography and manufacturing method thereofAKIYAMA SHOJI·Filed 2010·Granted Aug 27, 2013·12 cites·20 claims
- 0293US7951513B2Pellicle and method for producing pellicleSHINETSU CHEMICAL CO·Filed 2009·Granted May 31, 2011·16 cites·20 claims
- 0389US9238219B2Zeolite, manufacturing method of the same, and catalytic cracking batalyst of paraffinNIPPON CHEMICAL IND·Filed 2012·Granted Jan 19, 2016·9 cites·8 claims
- 0489US7693507B2Wireless network control device and wireless network control systemFUJITSU LTD·Filed 2006·Granted Apr 6, 2010·20 cites·15 claims
- 0588US11069560B2Method of transferring device layer to transfer substrate and highly thermal conductive substrateSHINETSU CHEMICAL CO·Filed 2017·Granted Jul 20, 2021·4 cites·7 claims
- 0688US7855127B2Method for manufacturing semiconductor substrateSHINETSU CHEMICAL CO·Filed 2008·Granted Dec 21, 2010·12 cites·12 claims
- 0787US6288444B1Semiconductor device and method of producing the sameFUJITSU LTD·Filed 1999·Granted Sep 11, 2001·80 cites·24 claims
- 0887US4395512APolyphenylenesulfide resin compositionSHINETSU CHEMICAL CO·Filed 1982·Granted Jul 26, 1983·44 cites·2 claims
- 0986US6333564B1Surface mount type semiconductor device and method of producing the same having an interposing layer electrically connecting the semiconductor chip with protrusion electrodesFUJITSU LTD·Filed 1999·Granted Dec 25, 2001·87 cites·14 claims
- 1086US5643483ACeramic heater made of fused silica glass having roughened surfaceSHINETSU CHEMICAL CO·Filed 1995·Granted Jul 1, 1997·69 cites·7 claims
- 1185US10612157B2Method for manufacturing SiC composite substrate, and method for manufacturing semiconductor substrateSHINETSU CHEMICAL CO·Filed 2016·Granted Apr 7, 2020·4 cites·9 claims
- 1284US8088670B2Method for manufacturing bonded substrate with sandblast treatmentAKIYAMA SHOJI·Filed 2008·Granted Jan 3, 2012·9 cites·24 claims
- 1384US7901846B2Pellicle and method for manufacturing the sameSHINETSU CHEMICAL CO·Filed 2008·Granted Mar 8, 2011·14 cites·13 claims
- 1483US9895683B2Zeolite, manufacturing method of the same, and catalytic cracking catalyst of paraffinUNIZEO CO LTD·Filed 2015·Granted Feb 20, 2018·2 cites·7 claims
- 1583US8263478B2Method for manufacturing semiconductor substrateAKIYAMA SHOJI·Filed 2010·Granted Sep 11, 2012·6 cites·2 claims
- 1683US5804468AProcess for manufacturing a packaged semiconductor having a divided leadframe stageFUJITSU LTD·Filed 1995·Granted Sep 8, 1998·65 cites·4 claims
- 1783US5497032ASemiconductor device and lead frame thereforeFUJITSU LTD·Filed 1994·Granted Mar 5, 1996·65 cites·45 claims
- 1881US8030176B2Method for preparing substrate having monocrystalline filmSHINETSU CHEMICAL CO·Filed 2009·Granted Oct 4, 2011·10 cites·16 claims
- 1981US6376977B1Silicon electrode plateSHINETSU CHEMICAL CO·Filed 2000·Granted Apr 23, 2002·27 cites·4 claims
- 2080US9512953B2Thermal insulation laminateSHINETSU CHEMICAL CO·Filed 2014·Granted Dec 6, 2016·2 cites·15 claims
- 2180US8829397B2Corrosion-resistant multilayer ceramic memberKANO SHOJI·Filed 2008·Granted Sep 9, 2014·11 cites·4 claims
- 2280US8614119B2Semiconductor device with heat spreaderFUKUDA TOMOYUKI·Filed 2012·Granted Dec 24, 2013·4 cites·8 claims
- 2380US5286567APellicle for photolithographic maskSHINETSU CHEMICAL CO·Filed 1992·Granted Feb 15, 1994·34 cites·2 claims
- 2479US9837301B2Method for producing hybrid substrates, and hybrid substrateSHINETSU CHEMICAL CO·Filed 2013·Granted Dec 5, 2017·5 cites·8 claims
- 2579US5470621AFrame-supported pellicle for dustproof protection of photomaskSHINETSU CHEMICAL CO·Filed 1994·Granted Nov 28, 1995·34 cites·5 claims
- 2679US5382469ACeramic-titanium nitride electrostatic chuckSHINETSU CHEMICAL CO·Filed 1993·Granted Jan 17, 1995·67 cites·3 claims
- 2778US5378514AFrame-supported pellicle for photolithographySHINETSU CHEMICAL CO·Filed 1993·Granted Jan 3, 1995·36 cites·4 claims
- 2877US7919217B2Pellicle and method for producing pellicleSHINETSU CHEMICAL CO·Filed 2009·Granted Apr 5, 2011·4 cites·16 claims
- 2977US6696754B2Semiconductor module including a plurality of semiconductor devices detachablyFUJITSU LTD·Filed 2002·Granted Feb 24, 2004·20 cites·10 claims
- 3077US5616927AFrame-supported pellicle for dustproof protection of photomaskSHINETSU CHEMICAL CO·Filed 1994·Granted Apr 1, 1997·30 cites·3 claims
- 3176US10711373B2SiC composite substrate and method for manufacturing sameSHINETSU CHEMICAL CO·Filed 2016·Granted Jul 14, 2020·2 cites·8 claims
- 3276US8278743B2Semiconductor device with heat spreaderFUKUDA TOMOYUKI·Filed 2011·Granted Oct 2, 2012·3 cites·20 claims
- 3376US7977209B2Method for manufacturing SOI substrateSHINETSU CHEMICAL CO·Filed 2007·Granted Jul 12, 2011·4 cites·9 claims
- 3476US5693382AFrame-supported pellicle for dustproof protection of photomask in photolithographySHINETSU CHEMICAL CO·Filed 1996·Granted Dec 2, 1997·36 cites·4 claims
- 3576US5324053AElectrostatic chuckSHINETSU CHEMICAL CO·Filed 1993·Granted Jun 28, 1994·57 cites·5 claims
- 3675US8021910B2Method for producing single crystal silicon solar cell and single crystal silicon solar cellSHINETSU CHEMICAL CO·Filed 2007·Granted Sep 20, 2011·2 cites·18 claims
- 3775US7749870B2Method for producing SOI substrateSHINETSU CHEMICAL CO·Filed 2009·Granted Jul 6, 2010·6 cites·9 claims
- 3874US7476811B2Semiconductor device and manufacturing method thereforFUJITSU LTD·Filed 2005·Granted Jan 13, 2009·6 cites·7 claims
- 3973US8551862B2Method of manufacturing laminated wafer by high temperature laminating methodAKIYAMA SHOJI·Filed 2010·Granted Oct 8, 2013·3 cites·8 claims
- 4073US6471940B1Preparation of zeoliteJAPAN CHEMICAL INNOVATION INST·Filed 2000·Granted Oct 29, 2002·15 cites·24 claims
- 4171US8119903B2Method of manufacturing single crystal silicon solar cell and single crystal silicon solar cellITO ATSUO·Filed 2007·Granted Feb 21, 2012·2 cites·18 claims
- 4271US6509124B1Method of producing diamond film for lithographySHINETSU CHEMICAL CO·Filed 2000·Granted Jan 21, 2003·13 cites·8 claims
- 4370US11876014B2Method of transferring device layer to transfer substrate and highly thermal conductive substrateSHINETSU CHEMICAL CO·Filed 2021·Granted Jan 16, 2024·0 cites·2 claims
- 4470US9425248B2Composite substrateSHINETSU CHEMICAL CO·Filed 2012·Granted Aug 23, 2016·2 cites·10 claims
- 4570US8138064B2Method for producing silicon film-transferred insulator waferAKIYAMA SHOJI·Filed 2009·Granted Mar 20, 2012·3 cites·16 claims
- 4669US9741603B2Method for producing hybrid substrate, and hybrid substrateSHINETSU CHEMICAL CO·Filed 2014·Granted Aug 22, 2017·2 cites·9 claims
- 4769US7892934B2SOI substrate and method for manufacturing SOI substrateSHINETSU CHEMICAL CO·Filed 2006·Granted Feb 22, 2011·4 cites·10 claims
- 4869US5574904ADatabase management system in an intelligent network using a common request data formatFUJITSU LTD·Filed 1994·Granted Nov 12, 1996·43 cites·17 claims
- 4968US6472744B2Semiconductor module including a plurality of semiconductor devices detachablyFUJITSU LTD·Filed 1998·Granted Oct 29, 2002·31 cites·17 claims
- 5068US5834143AFrame-supported dustproof pellicle for photolithographic photomaskSHINETSU CHEMICAL CO·Filed 1996·Granted Nov 10, 1998·26 cites·4 claims
Showing the top 50 of 177 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →