Inventor · disambiguated record
Yoichi Kurosawa
Also filed as: KUROSAWA YOICHI
10 granted patents·6 pending applications·40 citations·filing 2006–2025
87Inventor score
Top patents by PatentIndex Score
16 records- 0196US9806201B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2015·Granted Oct 31, 2017·16 cites·15 claims
- 0291US9437428B2Method of manufacturing a semiconductor device having an oxide semiconductor layer with increased hydrogen concentrationSEMICONDUCTOR ENERGY LAB·Filed 2014·Granted Sep 6, 2016·7 cites·14 claims
- 0390US11637015B2Method for manufacturing sputtering target, method for forming oxide film, and transistorSEMICONDUCTOR ENERGY LAB·Filed 2021·Granted Apr 25, 2023·1 cites·14 claims
- 0490US10522347B2Method for manufacturing sputtering target, method for forming oxide film, and transistorSEMICONDUCTOR ENERGY LAB·Filed 2017·Granted Dec 31, 2019·4 cites·20 claims
- 0590US9267199B2Method for manufacturing sputtering target, method for forming oxide film, and transistorSEMICONDUCTOR ENERGY LAB·Filed 2014·Granted Feb 23, 2016·6 cites·7 claims
- 0687US2025287691A1Manufacturing method of semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2025·Application pending·0 cites
- 0785US11967505B2Method for manufacturing sputtering target, method for forming oxide film, and transistorSEMICONDUCTOR ENERGY LAB·Filed 2023·Granted Apr 23, 2024·0 cites·5 claims
- 0881US12349460B2Manufacturing method of semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2022·Granted Jul 1, 2025·0 cites·8 claims
- 0981US11139166B2Method for manufacturing sputtering target, method for forming oxide film, and transistorSEMICONDUCTOR ENERGY LAB·Filed 2019·Granted Oct 5, 2021·1 cites·19 claims
- 1078US8624254B2Thin film transistorEGI YUJI·Filed 2011·Granted Jan 7, 2014·5 cites·24 claims
- 1166US2020035711A1Manufacturing method of semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2019·Application pending·0 cites
- 1258US2016343733A1Manufacturing method of semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2016·Application pending·0 cites
- 1357US2016160342A1Method for manufacturing sputtering target, method for forming oxide film, and transistorSEMICONDUCTOR ENERGY LAB·Filed 2016·Application pending·0 cites
- 1448US2021280397A1Plasma processing apparatus, semiconductive member, and semiconductive ringTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1542US7485874B2Apparatus for manufacturing semiconductor substratesSUMCO CORP·Filed 2006·Granted Feb 3, 2009·0 cites·14 claims
- 1632US2015329371A1Oxide, semiconductor device, module, and electronic deviceSEMICONDUCTOR ENERGY LAB·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →