Inventor · disambiguated record
Yoshitomo Nagahashi
Also filed as: NAGAHASHI YOSHITOMO
13 granted patents·14 pending applications·100 citations·filing 2001–2017
91Inventor score
Top patents by PatentIndex Score
27 records- 0189US7643129B2Exposure apparatus, exposure method, method for manufacturing deviceNIKON CORP·Filed 2006·Granted Jan 5, 2010·8 cites·37 claims
- 0285US7973906B2Exposure apparatus, exposure method, method for manufacturing deviceNIKON CORP·Filed 2007·Granted Jul 5, 2011·5 cites·13 claims
- 0382US7416574B2Filter apparatus, exposure apparatus, and device-producing methodNIKON CORP·Filed 2005·Granted Aug 26, 2008·13 cites·24 claims
- 0482US7116396B2Exposure device, exposure method and device manufacturing methodNIKON CORP·Filed 2004·Granted Oct 3, 2006·20 cites·40 claims
- 0582US6922910B2Exposure apparatusNIKON CORP·Filed 2003·Granted Aug 2, 2005·20 cites·22 claims
- 0680US7948608B2Exposure apparatus, exposure method, method for manufacturing deviceNIKON CORP·Filed 2009·Granted May 24, 2011·3 cites·24 claims
- 0778US9581913B2Exposure apparatus, exposure method, method for manufacturing deviceNIKON CORP·Filed 2014·Granted Feb 28, 2017·1 cites·34 claims
- 0870US7106414B2Exposure system and method for manufacturing deviceSENDAI NIKON CORP·Filed 2004·Granted Sep 12, 2006·11 cites·21 claims
- 0970US6753942B2Environmental control chamberNIKON CORP·Filed 2002·Granted Jun 22, 2004·9 cites·11 claims
- 1065US6784972B2Exposure apparatus, device manufacturing method and environmental control method of exposure apparatusNIKON CORP·Filed 2001·Granted Aug 31, 2004·10 cites·20 claims
- 1164US9829807B2Exposure apparatus, exposure method, method for manufacturing deviceNIPPON KOGAKU KK·Filed 2017·Granted Nov 28, 2017·0 cites·72 claims
- 1264US2018067406A1Exposure apparatus, exposure method, method for manufacturing deviceNIKON CORP·Filed 2017·Application pending·0 cites
- 1358US2009190113A1Projection exposure apparatus, projection exposure method, and method for producing deviceNIKON CORP·Filed 2009·Application pending·0 cites
- 1455US8896813B2Exposure apparatus, exposure method, method for manufacturing deviceNAGAHASHI YOSHITOMO·Filed 2011·Granted Nov 25, 2014·0 cites·35 claims
- 1555US2008030694A1Projection exposure apparatus, projection exposure method, and method for producing deviceNIKON CORP·Filed 2007·Application pending·0 cites
- 1654US2013278908A1Exposure apparatus and exposure method, maintenance method, and device manufacturing methodNIKON CORP·Filed 2013·Application pending·0 cites
- 1753US2006164617A1Projection exposure apparatus, projection exposure method, and method for producing deviceNIKON CORP·Filed 2006·Application pending·0 cites
- 1852US2010171940A1Projection exposure apparatus, projection exposure method, and method for producing deviceNIKON CORP·Filed 2010·Application pending·0 cites
- 1952US2008160895A1Atmosphere control apparatus, device-manufacturing apparatus, device-manufacturing method, and exposure apparatusNIKON CORP·Filed 2008·Application pending·0 cites
- 2051US8797502B2Exposure apparatus, exposure method, and method for producing device with electricity removal device by adding additive to liquidNAGAHASHI YOSHITOMO·Filed 2011·Granted Aug 5, 2014·0 cites·28 claims
- 2151US2007085989A1Exposure apparatus and exposure method, maintenance method, and device manufacturing methodNIKON CORP·Filed 2006·Application pending·0 cites
- 2248US2006274291A1Atmosphere control apparatus, device-manufacturing apparatus, device-manufacturing method, and exposure apparatusNIKON CORP·Filed 2006·Application pending·0 cites
- 2347US2006007415A1Exposure system and device production processNIKON CORP·Filed 2005·Application pending·0 cites
- 2442US2005088634A1Exposure system and device production processNIKON CORP·Filed 2004·Application pending·0 cites
- 2538US2001048513A1Environmental control chamberFiled 2001·Application pending·0 cites
- 2635US2002074635A1Exposure apparatus, holder container, device manufacturing method, and device manufacturing unitNIKON CORP·Filed 2001·Application pending·0 cites
- 2734US2002024647A1Exposure apparatus, lithography system and conveying method, and device manufacturing method and deviceNIKON CORP·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →