Inventor · disambiguated record
Yoshitomo Nakagawa
Also filed as: NAKAGAWA YOSHITOMO
22 granted patents·466 citations·filing 1986–2021
96Inventor score
Top patents by PatentIndex Score
22 records- 0193US4874460AMethod and apparatus for modifying patterned filmSEIKO INSTR INC·Filed 1988·Granted Oct 17, 1989·73 cites·7 claims
- 0290US5334834AInductively coupled plasma mass spectrometry deviceSEIKO INSTR INC·Filed 1993·Granted Aug 2, 1994·68 cites·5 claims
- 0390US4851097AApparatus for repairing a pattern filmSEIKO INSTR INC·Filed 1987·Granted Jul 25, 1989·63 cites·19 claims
- 0484US9726611B2Stabilized ICP emission spectrometer and method of usingHITACHI HIGH-TECH SCIENCE CORP·Filed 2015·Granted Aug 8, 2017·5 cites·11 claims
- 0584US4999492AInductively coupled plasma mass spectrometry apparatusSEIKO INSTR INC·Filed 1990·Granted Mar 12, 1991·48 cites·5 claims
- 0681US7755065B2Focused ion beam apparatusSII NANOTECHNOLOGY INC·Filed 2008·Granted Jul 13, 2010·7 cites·10 claims
- 0779US5559337APlasma ion source mass analyzing apparatusSEIKO INSTR INC·Filed 1994·Granted Sep 24, 1996·34 cites·19 claims
- 0879US5477048AInductively coupled plasma mass spectrometerSEIKO INSTR INC·Filed 1993·Granted Dec 19, 1995·35 cites·7 claims
- 0976US8274063B2Composite focused ion beam device, process observation method using the same, and processing methodKAITO TAKASHI·Filed 2008·Granted Sep 25, 2012·4 cites·20 claims
- 1076US4930439AMask-repairing deviceSEIKO INSTR INC·Filed 1988·Granted Jun 5, 1990·21 cites·19 claims
- 1168US6002129AInductively coupled plasma mass spectrometric and spectrochemical analyzerSEIKO INSTR INC·Filed 1998·Granted Dec 14, 1999·21 cites·2 claims
- 1265US5804821APlasma ion source mass analyzerSEIKO INSTR INC·Filed 1997·Granted Sep 8, 1998·18 cites·2 claims
- 1364US9820370B2Heat transfer system for an inductively coupled plasma deviceHITACHI HIGH-TECH SCIENCE CORP·Filed 2016·Granted Nov 14, 2017·1 cites·3 claims
- 1464US6031379APlasma ion mass analyzing apparatusSEIKO INSTR INC·Filed 1996·Granted Feb 29, 2000·17 cites·15 claims
- 1564US4902530AMethod of correcting a pattern filmSEIKO INSTR INC·Filed 1988·Granted Feb 20, 1990·16 cites·5 claims
- 1655US11906899B2Mask defect repair apparatus and mask defect repair methodHITACHI HIGH TECH SCIENCE CORP·Filed 2020·Granted Feb 20, 2024·0 cites·1 claims
- 1751US5773823APlasma ion source mass spectrometerSEIKO INSTR INC·Filed 1996·Granted Jun 30, 1998·10 cites·35 claims
- 1850US11721517B2Focused ion beam processing apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2021·Granted Aug 8, 2023·0 cites·8 claims
- 1947US5426299AInductive plasma mass spectrometerSEIKO INSTR INC·Filed 1994·Granted Jun 20, 1995·11 cites·5 claims
- 2047US4874632AProcess for forming pattern filmSEIKO INSTR INC·Filed 1986·Granted Oct 17, 1989·7 cites·33 claims
- 2130US5867262ASample introducing device for inductively coupled plasma analyzerSEIKO INSTR INC·Filed 1995·Granted Feb 2, 1999·6 cites·16 claims
- 2228US5071671AProcess for forming pattern filmsSEIKO INSTR INC·Filed 1989·Granted Dec 10, 1991·1 cites·23 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →