Inventor · disambiguated record
Yoshihiko Nakagawa
Also filed as: NAKAGAWA YOSHIHIKO
8 granted patents·2 pending applications·39 citations·filing 1976–2022
83Inventor score
Files withNAKAGAWA YOSHIHIKO3HITACHI INT ELECTRIC INC2KOKUSAI ELECTRIC CORP1SEGA CORP1SUGISHITA MASASHI1
Top patents by PatentIndex Score
10 records- 0178US8271119B2Substrate processing apparatus and substrate processing systemNAKAGAWA YOSHIHIKO·Filed 2009·Granted Sep 18, 2012·7 cites·18 claims
- 0270US7583264B2Apparatus and program for image generationSEGA CORP·Filed 2006·Granted Sep 1, 2009·8 cites·6 claims
- 0369US8712568B2Substrate processing apparatus and display method of substrate processing apparatusNAKAGAWA YOSHIHIKO·Filed 2010·Granted Apr 29, 2014·3 cites·14 claims
- 0468US10269603B2Substrate processing apparatus, gas-purging method, method for manufacturing semiconductor device, and recording medium containing abnormality-processing programHITACHI INT ELECTRIC INC·Filed 2014·Granted Apr 23, 2019·2 cites·14 claims
- 0561US8768502B2Substrate processing apparatus and substrate processing systemNAKAGAWA YOSHIHIKO·Filed 2012·Granted Jul 1, 2014·1 cites·14 claims
- 0648US2023106341A1Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2022·Application pending·0 cites
- 0739US8417394B2Substrate processing apparatus, semiconductor device manufacturing method and temperature controlling methodSUGISHITA MASASHI·Filed 2009·Granted Apr 9, 2013·0 cites·12 claims
- 0836US2013102159A1Substrate processing apparatus, substrate transfer method and method for manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2012·Application pending·0 cites
- 0930US4879118AGlycyrrhetinic acid-containing plastersYAMANOUCHI PHARMA CO LTD·Filed 1988·Granted Nov 7, 1989·13 cites·6 claims
- 1030US4039358AMethod of manufacturing an insulated gate type field effect semiconductor deviceTOKO INC·Filed 1976·Granted Aug 2, 1977·5 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →