Inventor · disambiguated record
Yoshinori Nishiwaki
Also filed as: NISHIWAKI YOSHINORI
13 granted patents·9 pending applications·170 citations·filing 1999–2024
91Inventor score
Files withFUJIFILM CORP8TOKYO ELECTRON LTD6CLARIANT FINANCE BVI LTD4AZ ELECTRONIC MATERIALS USA1CLARIANT INT LTD1
Top patents by PatentIndex Score
22 records- 0188US7851426B2Cleaning liquid and cleaning method using the sameFUJIFILM CORP·Filed 2007·Granted Dec 14, 2010·14 cites·11 claims
- 0287US7857985B2Metal-polishing liquid and chemical mechanical polishing method using the sameFUJIFILM CORP·Filed 2007·Granted Dec 28, 2010·17 cites·5 claims
- 0384US6277750B1Composition for bottom reflection preventive film and novel polymeric dye for use in the sameCLARIANT FINANCE BVI LTD·Filed 1999·Granted Aug 21, 2001·48 cites·18 claims
- 0478US2024379388A1Substrate processing apparatus, mixing method, and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0573US12068175B2Substrate processing apparatus, mixing method, and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Aug 20, 2024·0 cites·8 claims
- 0669US7836721B2Cooling systemSUNTORY HOLDINGS LTD·Filed 2005·Granted Nov 23, 2010·7 cites·5 claims
- 0765US11257692B2Substrate processing apparatus, mixing method, and substrate processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Feb 22, 2022·0 cites·11 claims
- 0865US6939661B2Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefromCLARIANT FINANCE BVI LTD·Filed 2002·Granted Sep 6, 2005·7 cites·2 claims
- 0965US6255405B1Light-absorbing polymers and application thereof to anti-reflection filmCLARIANT INT LTD·Filed 1999·Granted Jul 3, 2001·26 cites·8 claims
- 1062US6465148B1Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefromCLARIANT FINANCE BVI LTD·Filed 1999·Granted Oct 15, 2002·24 cites·4 claims
- 1162US6465161B1Method for forming resist patternCLARIANT FINANCE BVI LTD·Filed 1999·Granted Oct 15, 2002·21 cites·3 claims
- 1254US7255972B2Chemically amplified positive photosensitive resin compositionAZ ELECTRONIC MATERIALS USA·Filed 2003·Granted Aug 14, 2007·6 cites·9 claims
- 1351US2007232512A1Cleaning solution for substrate for use in semiconductor device and cleaning method using the sameFUJIFILM CORP·Filed 2007·Application pending·0 cites
- 1449US10844332B2Aqueous cleaning solution and method of protecting features on a substrate during etch residue removalTOKYO ELECTRON LTD·Filed 2018·Granted Nov 24, 2020·0 cites·18 claims
- 1549US2010167535A1Cleaning agent for semiconductor device and method for producing semiconductor device using the cleaning agentFUJIFILM CORP·Filed 2009·Application pending·0 cites
- 1646US9514958B2Etching method of semiconductor substrate, and method of producing semiconductor deviceFUJIFILM CORP·Filed 2015·Granted Dec 6, 2016·0 cites·47 claims
- 1746US2015087156A1Etching method, and method of producing semiconductor substrate product and semiconductor device using the same, as well as kit for preparation of etching liquidFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 1846US2009088361A1Cleaning agent for semiconductor device and cleaning method using the sameFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 1944US2007225187A1Cleaning solution for substrate for use in semiconductor device and cleaning method using the sameFUJIFILM CORP·Filed 2007·Application pending·0 cites
- 2041US2019096710A1Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 2138US2019096711A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 2224US2007072109A1Thick film or ultrathick film responsive chemical amplification type photosensitive resin compositionMAKII TOSHIMICHI·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →