Inventor · disambiguated record
Yoshihisa Oae
Also filed as: OAE YOSHIHISA
46 granted patents·1,316 citations·filing 1990–2013
99Inventor score
Top patents by PatentIndex Score
46 records- 0197US5369282AElectron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughputFUJITSU LTD·Filed 1993·Granted Nov 29, 1994·143 cites·22 claims
- 0297US5260579ACharged particle beam exposure system and charged particle beam exposure methodFUJITSU LTD·Filed 1992·Granted Nov 9, 1993·167 cites·33 claims
- 0391US6646275B2Charged particle beam exposure system and methodFUJITSU LTD·Filed 2002·Granted Nov 11, 2003·43 cites·7 claims
- 0489US6064807ACharged-particle beam exposure system and methodFUJITSU LTD·Filed 1996·Granted May 16, 2000·77 cites·32 claims
- 0588US5841145AMethod of and system for exposing pattern on object by charged particle beamFUJITSU LTD·Filed 1996·Granted Nov 24, 1998·60 cites·45 claims
- 0686US5399872ACharged-particle beam exposure methodFUJITSU LTD·Filed 1993·Granted Mar 21, 1995·51 cites·7 claims
- 0785US5401974ACharged particle beam exposure apparatus and method of cleaning the sameFUJITSU LTD·Filed 1994·Granted Mar 28, 1995·47 cites·25 claims
- 0884US6486479B1Charged particle beam exposure system and methodFUJITSU LTD·Filed 2000·Granted Nov 26, 2002·24 cites·8 claims
- 0984US5430304ABlanking aperture array type charged particle beam exposureFUJITSU LTD·Filed 1994·Granted Jul 4, 1995·45 cites·11 claims
- 1083US5719402AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 17, 1998·32 cites·11 claims
- 1183US5528048ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1995·Granted Jun 18, 1996·47 cites·21 claims
- 1281US5364718AMethod of exposing patttern of semiconductor devices and stencil mask for carrying out sameFUJITSU LTD·Filed 1993·Granted Nov 15, 1994·37 cites·8 claims
- 1379US5614725ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1996·Granted Mar 25, 1997·36 cites·12 claims
- 1478US5391886ACharged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure systemFUJITSU LTD·Filed 1993·Granted Feb 21, 1995·36 cites·18 claims
- 1576US6118129AMethod and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elementsFUJITSU LTD·Filed 1999·Granted Sep 12, 2000·30 cites·15 claims
- 1676US5546319AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1995·Granted Aug 13, 1996·21 cites·34 claims
- 1775US5288567AStencil mask and charged particle beam exposure method and apparatus using the stencil maskFUJITSU LTD·Filed 1991·Granted Feb 22, 1994·24 cites·22 claims
- 1874US5977548ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1996·Granted Nov 2, 1999·28 cites·11 claims
- 1973US5276331AElectron beam exposure systemFUJITSU LTD·Filed 1992·Granted Jan 4, 1994·24 cites·9 claims
- 2072US5041731ADeflection compensating device for converging lensFUJITSU LTD·Filed 1990·Granted Aug 20, 1991·24 cites·5 claims
- 2171US5304811ALithography system using charged-particle beam and method of using the sameFUJITSU LTD·Filed 1992·Granted Apr 19, 1994·23 cites·18 claims
- 2270US5245194AElectron beam exposure system having an electrostatic deflector wherein an electrostatic charge-up is eliminatedFUJITSU LTD·Filed 1992·Granted Sep 14, 1993·21 cites·10 claims
- 2369US5721432AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 24, 1998·16 cites·5 claims
- 2469US5404018AMethod of and an apparatus for charged particle beam exposureFUJITSU LTD·Filed 1992·Granted Apr 4, 1995·22 cites·11 claims
- 2568US5264706AElectron beam exposure system having an electromagnetic deflector configured for efficient coolingFUJITSU LTD·Filed 1992·Granted Nov 23, 1993·20 cites·7 claims
- 2667US5920077ACharged particle beam exposure systemFUJITSU LTD·Filed 1998·Granted Jul 6, 1999·21 cites·17 claims
- 2767US5382800ACharged particle beam exposure method and apparatusFUJITSU LTD·Filed 1993·Granted Jan 17, 1995·18 cites·20 claims
- 2866US5376802AStencil mask and charge particle beam exposure method and apparatus using the stencil maskFUJITSU LTD·Filed 1993·Granted Dec 27, 1994·17 cites·5 claims
- 2965US8992086B2X-Y constraining unit, and stage apparatus and vacuum stage apparatus including the sameKYOCERA CORP·Filed 2013·Granted Mar 31, 2015·1 cites·20 claims
- 3065US5965895AMethod of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposureFUJITSU LTD·Filed 1997·Granted Oct 12, 1999·13 cites·9 claims
- 3164US5449915AElectron beam exposure system capable of detecting failure of exposureFUJITSU LTD·Filed 1994·Granted Sep 12, 1995·17 cites·8 claims
- 3264US5359202AElectron beam exposure apparatus employing blanking aperture arrayFUJITSU LTD·Filed 1993·Granted Oct 25, 1994·23 cites·7 claims
- 3362US5338939ACharged particle beam exposure including a heat blocking partition positioned near deflecting coilsFUJITSU LTD·Filed 1993·Granted Aug 16, 1994·15 cites·19 claims
- 3456US5590048ABlock exposure pattern data extracting system and method for charged particle beam exposureFUJITSU LTD·Filed 1993·Granted Dec 31, 1996·12 cites·42 claims
- 3553US5420433ACharged particle beam exposure apparatusFUJITSU LTD·Filed 1994·Granted May 30, 1995·10 cites·11 claims
- 3653US5180919AElectron beam exposure system having the capability of checking the pattern of an electron mask used for shaping an electron beamFUJITSU LTD·Filed 1991·Granted Jan 19, 1993·10 cites·9 claims
- 3752US5432314ATransparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plateFUJITSU LTD·Filed 1993·Granted Jul 11, 1995·10 cites·20 claims
- 3851US5444257AElectron-beam exposure system for reduced distortion of electron beam spotFUJITSU LTD·Filed 1994·Granted Aug 22, 1995·8 cites·5 claims
- 3949US8382911B2Stage device and stage cleaning methodADVANTEST CORP·Filed 2011·Granted Feb 26, 2013·0 cites·5 claims
- 4049US5117117AElectron beam exposure system having an improved seal element for interfacing electric connectionsFUJITSU LTD·Filed 1991·Granted May 26, 1992·9 cites·10 claims
- 4148US5631113AElectron-beam exposure system for reduced distortion of electron beam spotFUJITSU LTD·Filed 1995·Granted May 20, 1997·7 cites·6 claims
- 4248US5194741AMethod for writing a pattern on an object by a focused electron beam with an improved efficiencyFUJITSU LTD·Filed 1992·Granted Mar 16, 1993·9 cites·8 claims
- 4348US5130547ACharged-particle beam exposure method and apparatusFUJITSU LTD·Filed 1990·Granted Jul 14, 1992·8 cites·14 claims
- 4447US5223719AMask for use in a charged particle beam apparatus including beam passing sectionsFUJITSU LTD·Filed 1991·Granted Jun 29, 1993·7 cites·16 claims
- 4539US8281794B2Stage device and stage cleaning methodOAE YOSHIHISA·Filed 2010·Granted Oct 9, 2012·0 cites·6 claims
- 4636US5272347AApparatus for adjusting a focal position of an electron beam and electron beam projection apparatus including the sameFUJITSU LTD·Filed 1992·Granted Dec 21, 1993·3 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →