Inventor · disambiguated record
Yoshihiro Sawada
Also filed as: SAWADA YOSHIHIRO
33 granted patents·7 pending applications·249 citations·filing 1990–2020
96Inventor score
Files withTOKYO OHKA KOGYO CO LTD23FUJITSU LTD7KOSHIYAMA JUN2OKI ELECTRIC IND CO LTD2AGENCY IND SCIENCE TECHN1
Top patents by PatentIndex Score
40 records- 0189US7741260B2Rinsing fluid for lithographyTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jun 22, 2010·12 cites·4 claims
- 0287US7795197B2Cleaning liquid for lithography and method for resist pattern formationTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Sep 14, 2010·10 cites·13 claims
- 0386US6303231B1Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric memories formed with said coating solutions, as well as processes for production thereofTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Oct 16, 2001·65 cites·13 claims
- 0482US5066553ASurface-coated tool member of tungsten carbide based cemented carbideMITSUBISHI METAL CORP·Filed 1990·Granted Nov 19, 1991·46 cites·6 claims
- 0580US8367312B2Detergent for lithography and method of forming resist pattern with the sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Feb 5, 2013·5 cites·8 claims
- 0679US9507905B2Storage medium storing circuit board design assistance program, circuit board design assistance method, and circuit board design assistance deviceFUJITSU LTD·Filed 2015·Granted Nov 29, 2016·3 cites·8 claims
- 0773US8058220B2Cleaning liquid for lithography and a cleaning method using it for photoexposure devicesKOSHIYAMA JUN·Filed 2010·Granted Nov 15, 2011·2 cites·9 claims
- 0871US7897325B2Lithographic rinse solution and method for forming patterned resist layer using the sameTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Mar 1, 2011·2 cites·8 claims
- 0969US9831086B2Method for manufacturing semiconductor substrateTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Nov 28, 2017·1 cites·6 claims
- 1067US9620354B2Method for manufacturing semiconductor substrate with diffusion agent compositionTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Apr 11, 2017·1 cites·6 claims
- 1167US7811748B2Resist pattern forming method and composite rinse agentTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Oct 12, 2010·2 cites·12 claims
- 1263US7952578B2Support apparatus, design support program, and design support methodFUJITSU LTD·Filed 2009·Granted May 31, 2011·2 cites·20 claims
- 1363US5695816AProcess for the preparation of carbon fiber reinforced carbon compositesAGENCY IND SCIENCE TECHN·Filed 1995·Granted Dec 9, 1997·19 cites·4 claims
- 1460US9173295B2Support apparatusFUJITSU LTD·Filed 2013·Granted Oct 27, 2015·0 cites·7 claims
- 1555US9713262B2Via adding methodFUJITSU LTD·Filed 2015·Granted Jul 18, 2017·0 cites·6 claims
- 1655US5811153ACoating solutions for use in forming bismuth-based dielectric thin films, and dielectric thin films and memories formed with said coating solutions, as well as processes for production thereofTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Sep 22, 1998·20 cites·17 claims
- 1751US6187069B1Composite bond wheel and wheel having resin bonding phaseMITSUBISHI MATERIALS CORP·Filed 1999·Granted Feb 13, 2001·18 cites·23 claims
- 1848US11120993B2Diffusing agent composition and method of manufacturing semiconductor substrateTOKYO OHKA KOGYO CO LTD·Filed 2020·Granted Sep 14, 2021·0 cites·13 claims
- 1948US8850376B2Method, device, and a computer-readable recording medium having stored program for information processing for noise suppression design checkFUJITSU LTD·Filed 2013·Granted Sep 30, 2014·0 cites·10 claims
- 2048US6528172B2Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric thin films, ferroelectric capacitors and ferroelectric memories formed with said coating solutions, as well as processes for production thereofTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Mar 4, 2003·2 cites·10 claims
- 2148US6120912ACoating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric thin films, ferroelectric capacitors and ferroelectric memories formed with said coating solutions, as well as processes for production thereofTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Sep 19, 2000·11 cites·4 claims
- 2247US11773287B2Method for forming coatingTOKYO OHKA KOGYO CO LTD·Filed 2020·Granted Oct 3, 2023·0 cites·6 claims
- 2347US10525418B2Purification method for purifying liquid, purification method for purifying silicon compound-containing liquid, method for producing silylating agent liquid, film forming material or diffusing agent composition, filter medium and filter deviceTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Jan 7, 2020·0 cites·18 claims
- 2446US8584076B2Printed circuit board design assisting device, method, and programNAGASE KENJI·Filed 2011·Granted Nov 12, 2013·0 cites·11 claims
- 2546US6197102B1Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric thin films, ferroelectric capacitors and ferroelectric memories formed with said coating solutions, as well as processes for production thereofTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Mar 6, 2001·11 cites·10 claims
- 2645US5972096ACoating solutions for use in forming bismuth-based ferroelectric thin filmsTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Oct 26, 1999·9 cites·11 claims
- 2744US10242875B2Impurity diffusion agent composition and method for manufacturing semiconductor substrateTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Mar 26, 2019·0 cites·7 claims
- 2842US2013241572A1Shield inspection device and shield inspection methodFUJITSU LTD·Filed 2012·Application pending·0 cites
- 2941US10504732B2Impurity diffusion agent composition and method for manufacturing semiconductor substrateTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Dec 10, 2019·0 cites·8 claims
- 3041US10242874B2Diffusing agent composition and method of manufacturing semiconductor substrateTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Mar 26, 2019·0 cites·9 claims
- 3141US2012084034A1Non-transitory computer-readable medium storing design check program, design check apparatus, and design check methodHIRATSUKA YOSHIAKI·Filed 2011·Application pending·0 cites
- 3241US2008193876A1Rinsing Liquid for Lithography and Method for Resist Pattern FormationTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 3340US2007218412A1Rinse Solution For LithographyTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 3440US2007292808A1Developing Solution Composition for Lithography and Method for Resist Pattern FormationKOSHIYAMA JUN·Filed 2005·Application pending·0 cites
- 3539US5976705AFerroelectric thin film, making method thereof and coating liquid for making thin filmOKI ELECTRIC IND CO LTD·Filed 1996·Granted Nov 2, 1999·6 cites·24 claims
- 3638US9905917B2Antenna deviceFUJITSU LTD·Filed 2016·Granted Feb 27, 2018·0 cites·4 claims
- 3736US2016314975A1Diffusion agent compositionTOKYO OHKA KOGYO CO LTD·Filed 2016·Application pending·0 cites
- 3836US2016293425A1Method for manufacturing semiconductor substrateTOKYO OHKA KOGYO CO LTD·Filed 2016·Application pending·0 cites
- 3933US8790990B2Silica-based film forming material for formation of air gaps, and method for forming air gapsSAWADA YOSHIHIRO·Filed 2011·Granted Jul 29, 2014·0 cites·6 claims
- 4032US6403160B1Ferroelectric thin film, production method thereof and coating liquid for making thin filmOKI ELECTRIC IND CO LTD·Filed 1999·Granted Jun 11, 2002·2 cites·11 claims
Join the waitlist — get patent alerts
Get an alert when Yoshihiro Sawada files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →