Inventor · disambiguated record
Yoshiki Sugeta
Also filed as: SUGETA YOSHIKI
18 granted patents·25 pending applications·279 citations·filing 1996–2010
94Inventor score
Top patents by PatentIndex Score
43 records- 0194US6063953AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted May 16, 2000·90 cites·6 claims
- 0292US6811817B2Method for reducing pattern dimension in photoresist layerTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Nov 2, 2004·47 cites·4 claims
- 0381US7553610B2Method of forming fine patternsTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Jun 30, 2009·6 cites·7 claims
- 0479US8124318B2Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2010·Granted Feb 28, 2012·2 cites·20 claims
- 0578US7189499B2Method of forming fine patternsTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Mar 13, 2007·15 cites·7 claims
- 0671US5902713AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted May 11, 1999·23 cites·10 claims
- 0769US6022666AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Feb 8, 2000·21 cites·10 claims
- 0868US7235345B2Agent for forming coating for narrowing patterns and method for forming fine pattern using the sameTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jun 26, 2007·9 cites·6 claims
- 0966US6399275B1Negative-working photolithographic patterning material and method for the preparation of ion-implanted and metal-plated substrates by using the sameTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Jun 4, 2002·11 cites·12 claims
- 1061US6042988AChemical-amplification-type negative resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Mar 28, 2000·20 cites·15 claims
- 1160US5955241AChemical-amplification-type negative resist composition and method for forming negative resist patternTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Sep 21, 1999·19 cites·10 claims
- 1258US8187798B2Method of forming fine patternsSUGETA YOSHIKI·Filed 2009·Granted May 29, 2012·0 cites·6 claims
- 1357US8142980B2Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Granted Mar 27, 2012·0 cites·13 claims
- 1457US2009041948A1Method of forming fine patternsSHINBORI HIROSHI·Filed 2008·Application pending·0 cites
- 1557US2010075263A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 1657US2009186156A1Method of forming fine patternsSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 1756US2009148611A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 1856US2010139838A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 1955US2009011601A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2008·Application pending·0 cites
- 2055US2008145539A1Method of forming fine patternsSUGETA YOSHIKI·Filed 2008·Application pending·0 cites
- 2155US2009126855A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 2253US2006263728A1Method of forming fine patternsSHINBORI HIROSHI·Filed 2006·Application pending·0 cites
- 2352US2007213447A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2007·Application pending·0 cites
- 2451US2006258809A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2006·Application pending·0 cites
- 2550US2010272909A1Method of forming fine patternsSHINBORI HIROSHI·Filed 2010·Application pending·0 cites
- 2650US2006099347A1Method for reducing pattern dimension in photoresist layerSUGETA YOSHIKI·Filed 2005·Application pending·0 cites
- 2750US2006003601A1Method of forming fine patternsSUGETA YOSHIKI·Filed 2005·Application pending·0 cites
- 2849US2006079628A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2005·Application pending·0 cites
- 2948US5928837ANegative-working chemical-sensitization photoresist composition comprising oxime sulfonate compoundsTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jul 27, 1999·14 cites·10 claims
- 3048US2005245663A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2005·Application pending·0 cites
- 3147US7579138B2Method for forming micropatternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Aug 25, 2009·0 cites·4 claims
- 3244US2005058950A1Method for reducing pattern dimension in photoresist layerFiled 2004·Application pending·0 cites
- 3343US2005009365A1Method of forming fine patternsFiled 2003·Application pending·0 cites
- 3443US2005175926A1Coating forming agent for reducing pattern dimension and method of forming fine pattern therewithTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 3542US2004121615A1Method of forming fine patternsFiled 2003·Application pending·0 cites
- 3642US2004067303A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentFiled 2003·Application pending·0 cites
- 3742US2004137377A1Method for forming fine patternsSHINBORI HIROSHI·Filed 2002·Application pending·0 cites
- 3842US2004106737A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentFiled 2003·Application pending·0 cites
- 3942US2003008968A1Method for reducing pattern dimension in photoresist layerFiled 2002·Application pending·0 cites
- 4040US5990338ANegative-working chemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Nov 23, 1999·1 cites·6 claims
- 4140US5973187APositive-working chemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Oct 26, 1999·1 cites·6 claims
- 4239US8043798B2Method of forming fine patternsTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Oct 25, 2011·0 cites·7 claims
- 4337US2005123851A1Coating material for pattern fineness enhancement and method of forming fine pattern with the sameFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →