Inventor · disambiguated record
Yoko Takebe
Also filed as: TAKEBE YOKO · YOKOKOJI OSAMU
17 granted patents·9 pending applications·305 citations·filing 2002–2014
93Inventor score
Top patents by PatentIndex Score
26 records- 0195US6916590B2Resist compositionASAHI GLASS CO LTD·Filed 2002·Granted Jul 12, 2005·86 cites·10 claims
- 0294US7244545B2Fluorinated compound, fluoropolymer and process for its productionASAHI GLASS CO LTD·Filed 2006·Granted Jul 17, 2007·21 cites·15 claims
- 0392US6818258B2Resist compositionASAHI GLASS CO LTD·Filed 2003·Granted Nov 16, 2004·106 cites·9 claims
- 0490US7015366B2Fluorinated compound, fluoropolymer and process for its productionASAHI GLASS CO LTD·Filed 2005·Granted Mar 21, 2006·11 cites·4 claims
- 0590US6858692B2Fluorinated compound, fluoropolymer and process for its productionASAHI GLASS CO LTD·Filed 2003·Granted Feb 22, 2005·24 cites·8 claims
- 0684US6984704B2Fluorinated compound, fluoropolymer and process for its productionASAHI GLASS CO LTD·Filed 2005·Granted Jan 10, 2006·6 cites·10 claims
- 0780US7091294B2Fluoropolymer and resist compositionASAHI GLASS CO LTD·Filed 2005·Granted Aug 15, 2006·7 cites·20 claims
- 0877US7550545B2Fluorinated compound, and fluoropolymer, process for its production and resist composition containing itASAHI GLASS CO LTD·Filed 2007·Granted Jun 23, 2009·3 cites·9 claims
- 0977US7026416B2FluoropolymerASAHI GLASS CO LTD·Filed 2005·Granted Apr 11, 2006·4 cites·4 claims
- 1077US6733952B2Resist compositionASAHI GLASS CO LTD·Filed 2002·Granted May 11, 2004·14 cites·8 claims
- 1171US8178983B2Water repellant composition for substrate to be exposed, method for forming resist pattern, electronic device produced by the formation method, treatment method for imparting water repellency to substrate to be exposed, water repellant set for substrate to be exposed, and treatment method for imparting water repellency to substrate to be exposed using the sameISHIBASHI TAKEO·Filed 2009·Granted May 15, 2012·3 cites·14 claims
- 1265US6815146B2Resist compositionASAHI GLASS CO LTD·Filed 2003·Granted Nov 9, 2004·20 cites·30 claims
- 1364US7825275B2Fluorinated compound, fluoropolymer and method for producing the compoundASAHI GLASS CO LTD·Filed 2009·Granted Nov 2, 2010·0 cites·11 claims
- 1457US2009221845A1Fluorinated compound, and fluoropolymer, process for its production and resist composition containing itASAHI GLASS CO LTD·Filed 2009·Application pending·0 cites
- 1555US8236901B2Fluorinated compound, fluoropolymer and method for producing the compoundMURATA KOICHI·Filed 2010·Granted Aug 7, 2012·0 cites·20 claims
- 1654US8134033B2Fluorocompound having highly fluorinated norbornane structure, fluoropolymer, and their production processesMATSUKAWA YASUHISA·Filed 2009·Granted Mar 13, 2012·0 cites·8 claims
- 1751US2006122348A1Fluorinated compound, and fluoropolymer, process for its production and resist composition containing itASAHI GLASS CO LTD·Filed 2006·Application pending·0 cites
- 1848US9223200B2Pellicle for lithography, pellicle-mounted photomask, and exposure treatment methodASAHI GLASS CO LTD·Filed 2014·Granted Dec 29, 2015·0 cites·10 claims
- 1946US2005202345A1Resist compositionASAHI GLASS CO LTD·Filed 2005·Application pending·0 cites
- 2046US2012065347A1Fluorocompound having highly fluorinated norbornane structure, fluoropolymer, and their production processesMATSUKAWA YASUHISA·Filed 2011·Application pending·0 cites
- 2146US2009061360A1Material for resist protective film for immersion lithographyASAHI GLASS CO LTD·Filed 2008·Application pending·0 cites
- 2244US2013119363A1Fluorine-containing aromatic compound, organic semiconductor material and organic thin film deviceASAHI GLASS CO LTD·Filed 2013·Application pending·0 cites
- 2341US2007083021A1Fluorocopolymer, method for its production and resist composition containing itASAHI GLASS CO LTD·Filed 2006·Application pending·0 cites
- 2439US2012156504A1Coating material composition for liquid immersion exposure apparatus, laminate, method for forming laminate, and liquid immersion exposure apparatusTAKEBE YOKO·Filed 2012·Application pending·0 cites
- 2538US2006135663A1Fluorinated copolymer process for its production and resist composition containing itASAHI GLASS CO LTD·Filed 2006·Application pending·0 cites
- 2628US7498393B2Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective filmASAHI GLASS CO LTD·Filed 2007·Granted Mar 3, 2009·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →