Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it

Abstract

To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF 2 ═CFCH 2 CH-Q-CH 2 CH═CH 2   (1) wherein Q is (CH 2 ) a C(CF 3 ) 2 OR 4 (wherein a is an integer of from 0 to 3, R 4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH 2 R 5 (wherein R 5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH 2 ) d COOR 6 (wherein d is 0 or 1, and R 6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.

1 - 3 . (canceled) 
   
   
       4 . A fluorinated diene represented by the following formula (3):
   CF 2 ═CFCH 2 CH((CH 2 ) d COOR 6 )—CH 2 CH═CH 2   (3)   wherein
 d is 0 or 1, and 
 R 6  is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms. 
   
   
   
       5 . (canceled) 
   
   
       6 . The fluorinated diene according to  claim 4 , wherein d is 0. 
   
   
       7 . The fluorinated diene according to  claim 4 , wherein d is 1. 
   
   
       8 . The fluorinated diene according to  claim 4 , wherein R 6  is a hydrogen atom. 
   
   
       9 . The fluorinated diene according to  claim 4 , wherein R 6  is an alkyl group. 
   
   
       10 . The fluorinated diene according to  claim 4 , wherein R 6  is a fluorinated alkyl group having at most 20 carbon atoms.