Inventor · disambiguated record
Yoann Tomczak
Also filed as: TOMCZAK YOANN · TOMCZAK YOANN FRANCIS
4 granted patents·15 pending applications·0 citations·filing 2019–2025
55Inventor score
Top patents by PatentIndex Score
19 records- 0167US12469703B2Methods for forming spacers and related structuresASM IP HOLDING BV·Filed 2023·Granted Nov 11, 2025·0 cites·17 claims
- 0266US12504689B2Photosensitive material and method of forming patterned structuresASM IP HOLDING BV·Filed 2023·Granted Dec 23, 2025·0 cites·17 claims
- 0366US2023420256A1Method of forming a photoresist underlayer and structure including sameASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 0463US2024218510A1Methods for forming and utilizing antimony containing films, and related structuresASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 0563US2025377598A1Methods, structures, and systems for lithographic patterningASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 0663US2024419068A1Structures for patterning and related methods and systemsASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 0762US2024201596A1Methods and related systems for depositing EUV sensitive filmsASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 0859US2025270695A1Methods, structures, and systems for lithographic patterningASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 0957US12394626B2Method of forming a structure and system for sameASM IP HOLDING BV·Filed 2022·Granted Aug 19, 2025·0 cites·20 claims
- 1056US11735422B2Method of forming a photoresist underlayer and structure including sameASM IP HOLDING BV·Filed 2020·Granted Aug 22, 2023·0 cites·15 claims
- 1156US2024274313A1Structures for patterning substrates and methods and systems for their manufactureASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 1256US2024339321A1Methods, systems, and structures for patterning substratesASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 1356US2025110411A1Method for forming a pattern on a substrateASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 1454US2023091094A1Method of forming a photoresist absorber layer and structure including sameASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 1552US2025372363A1Method and apparatus for hard mask depositionASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 1652US2023324803A1Gas-phase method of forming radiation-sensitive patternable materialASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 1750US2023059464A1Method of forming patterned structuresASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 1845US2023054940A1Method of forming patterned featuresASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 1939US2020111892A1Process of forming a gate of a semiconductor deviceIMEC VZW·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →