Inventor · disambiguated record
Yoshimi Watabe
Also filed as: WATABE YOSHIMI
9 granted patents·2 pending applications·341 citations·filing 1994–2008
89Inventor score
Files withANELVA CORP3ISHIKAWAJIMA HARIMA HEAVY IND2NEC CORP2CANON ANELVA CORP1NAT INST OF ADVANCED IND SCIEN1
Top patents by PatentIndex Score
11 records- 0195US6861614B1S system for the formation of a silicon thin film and a semiconductor-insulating film interfaceNEC CORP·Filed 2000·Granted Mar 1, 2005·156 cites·11 claims
- 0292US6189485B1Plasma CVD apparatus suitable for manufacturing solar cell and the likeANELVA CORP·Filed 1999·Granted Feb 20, 2001·81 cites·11 claims
- 0386US7312418B2Semiconductor thin film forming systemNEC CORP·Filed 2004·Granted Dec 25, 2007·32 cites·9 claims
- 0482US6503816B2Thin film formation by inductively-coupled plasma CVD processNAT INST OF ADVANCED IND SCIEN·Filed 2001·Granted Jan 7, 2003·24 cites·23 claims
- 0577US6664496B2Plasma processing systemANELVA CORP·Filed 2002·Granted Dec 16, 2003·13 cites·5 claims
- 0664US8002947B2Plasma treatment system and cleaning method of the sameSANYO ELECTRIC CO·Filed 2008·Granted Aug 23, 2011·0 cites·5 claims
- 0761US5437895APlasma CVD process for forming amorphous silicon thin filmANELVA CORP·Filed 1994·Granted Aug 1, 1995·31 cites·10 claims
- 0860US7530359B2Plasma treatment system and cleaning method of the sameCANON ANELVA CORP·Filed 2002·Granted May 12, 2009·4 cites·5 claims
- 0950US2007166945A1Semiconductor thin film forming systemTANABE HIROSHI·Filed 2007·Application pending·0 cites
- 1039US2005067934A1Discharge apparatus, plasma processing method and solar cellISHIKAWAJIMA HARIMA HEAVY IND·Filed 2003·Application pending·0 cites
- 1138US7913752B2Cooling device for vacuum treatment deviceISHIKAWAJIMA HARIMA HEAVY IND·Filed 2004·Granted Mar 29, 2011·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →