Inventor · disambiguated record
Yusuke Anno
Also filed as: ANNO YUSUKE
8 granted patents·10 pending applications·9 citations·filing 2011–2023
79Inventor score
Top patents by PatentIndex Score
18 records- 0183US8993223B2Resist pattern-forming methodJSR CORP·Filed 2014·Granted Mar 31, 2015·2 cites·13 claims
- 0279US8859191B2Pattern-forming method, and composition for forming resist underlayer filmMATSUMURA YUSHI·Filed 2012·Granted Oct 14, 2014·4 cites·7 claims
- 0378US8669042B2Resist pattern-forming methodANNO YUSUKE·Filed 2012·Granted Mar 11, 2014·2 cites·9 claims
- 0462US10025188B2Resist pattern-forming methodJSR CORP·Filed 2017·Granted Jul 17, 2018·0 cites·17 claims
- 0560US2016320705A1Resist pattern-forming methodJSR CORP·Filed 2016·Application pending·0 cites
- 0658US2016097978A1Resist pattern-forming methodJSR CORP·Filed 2015·Application pending·0 cites
- 0758US2023069221A1Composition for resist underlayer film formation, and method of producing semiconductor substrateJSR CORP·Filed 2022·Application pending·0 cites
- 0857US8501385B2Positive-type radiation-sensitive composition, and resist pattern formation methodANNO YUSUKE·Filed 2011·Granted Aug 6, 2013·1 cites·12 claims
- 0956US9046769B2Pattern-forming method, and composition for forming resist underlayer filmJSR CORP·Filed 2014·Granted Jun 2, 2015·0 cites·11 claims
- 1056US2015160556A1Resist pattern-forming methodJSR CORP·Filed 2015·Application pending·0 cites
- 1152US2023340266A1Silicon-containing composition and method for manufacturing semiconductor substrateJSR CORP·Filed 2023·Application pending·0 cites
- 1249US2023053159A1Resist underlayer film-forming composition, resist underlayer film, and method of producing semiconductor substrateJSR CORP·Filed 2022·Application pending·0 cites
- 1346US2022146940A1Composition, silicon-containing film, method of forming silicon-containing film, and method of treating semiconductor substrateJSR CORP·Filed 2022·Application pending·0 cites
- 1446US2019155162A1Pattern-forming method and composition for resist pattern-refinementJSR CORP·Filed 2019·Application pending·0 cites
- 1543US10216090B2Pattern-forming method and composition for resist pattern-refinementJSR CORP·Filed 2016·Granted Feb 26, 2019·0 cites·14 claims
- 1641US9329478B2Polysiloxane composition and pattern-forming methodJSR CORP·Filed 2013·Granted May 3, 2016·0 cites·12 claims
- 1738US2019025699A1Film-forming material for resist process and pattern-forming methodJSR CORP·Filed 2018·Application pending·0 cites
- 1833US2011223544A1Resist pattern coating agent and resist pattern forming method using the sameJSR CORP·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →