Inventor · disambiguated record
Yung-Feng Cheng
Also filed as: CHENG YUNG-FENG
21 granted patents·4 pending applications·33 citations·filing 2003–2025
91Inventor score
Top patents by PatentIndex Score
25 records- 0194US9698047B2Dummy gate technology to avoid shorting circuitUNITED MICROELECTRONICS CORP·Filed 2015·Granted Jul 4, 2017·12 cites·12 claims
- 0289US9786647B1Semiconductor layout structureUNITED MICROELECTRONICS CORP·Filed 2016·Granted Oct 10, 2017·7 cites·9 claims
- 0388US2025366086A1Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2025·Application pending·0 cites
- 0483US10139723B2Method of forming photomaskUNITED MICROELECTRONICS CORP·Filed 2016·Granted Nov 27, 2018·4 cites·16 claims
- 0582US10026726B2Dummy gate technology to avoid shorting circuitUNITED MICROELECTRONICS CORP·Filed 2017·Granted Jul 17, 2018·3 cites·5 claims
- 0678US12408393B2Semiconductor device with a single diffusion break structure and a gate structure having aligned sidewallsUNITED MICROELECTRONICS CORP·Filed 2023·Granted Sep 2, 2025·0 cites·8 claims
- 0778US12278265B2Method for fabricating a fin with minimal length between two single-diffusion break (SDB) trenchesUNITED MICROELECTRONICS CORP·Filed 2023·Granted Apr 15, 2025·0 cites·10 claims
- 0877US9613969B2Semiconductor structure and method of forming the sameUNITED MICROELECTRONICS CORP·Filed 2015·Granted Apr 4, 2017·2 cites·6 claims
- 0969US8782569B1Method for inspecting photo-maskUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jul 15, 2014·2 cites·6 claims
- 1068US11715759B2Semiconductor device with a single diffusion break structure having a sidewall aligned with a gate sidewallUNITED MICROELECTRONICS CORP·Filed 2020·Granted Aug 1, 2023·0 cites·9 claims
- 1164US11934106B2Optical proximity correction device and methodUNITED MICROELECTRONICS CORP·Filed 2022·Granted Mar 19, 2024·0 cites·20 claims
- 1261US8042069B2Method for selectively amending layout patternsUNITED MICROELECTRONICS CORP·Filed 2008·Granted Oct 18, 2011·3 cites·36 claims
- 1357US11977335B2Pattern decomposition methodUNITED MICROELECTRONICS CORP·Filed 2021·Granted May 7, 2024·0 cites·7 claims
- 1455US2023400759A1Photomask design correction methodUNITED MICROELECTRONICS CORP·Filed 2022·Application pending·0 cites
- 1554US2024162038A1Photomask structure, semiconductor structure and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2023·Application pending·0 cites
- 1651US9859170B2Method of forming semiconductor structureUNITED MICROELECTRONICS CORP·Filed 2017·Granted Jan 2, 2018·0 cites·13 claims
- 1747US10797059B2Method of designing a layout of a static random access memory patternUNITED MICROELECTRONICS CORP·Filed 2018·Granted Oct 6, 2020·0 cites·19 claims
- 1846US10444622B2Method for generating masks for manufacturing of a semiconductor structureUNITED MICROELECTRONICS CORP·Filed 2018·Granted Oct 15, 2019·0 cites·7 claims
- 1943US7498105B2Method for checking phase shift angle of phase shift mask, lithography process and phase shift maskUNITED MICROELECTRONICS CORP·Filed 2005·Granted Mar 3, 2009·0 cites·16 claims
- 2041US10387602B2Method for generating masks for manufacturing of a semiconductor structure and method for manufacturing a semiconductor structure using the sameUNITED MICROELECTRONICS CORP·Filed 2018·Granted Aug 20, 2019·0 cites·13 claims
- 2140US10474026B2Method for correcting bevel corners of a layout patternUNITED MICROELECTRONICS CORP·Filed 2016·Granted Nov 12, 2019·0 cites·16 claims
- 2238US8810785B2Mask inspecting methodLO WEI-CYUAN·Filed 2011·Granted Aug 19, 2014·0 cites·16 claims
- 2338US7498104B2Phase shift photomaskUNITED MICROELECTRONICS CORP·Filed 2004·Granted Mar 3, 2009·0 cites·19 claims
- 2436US10622461B1Manufacturing method of semiconductor device having replacement gate in trenchUNITED MICROELECTRONICS CORP·Filed 2019·Granted Apr 14, 2020·0 cites·19 claims
- 2534US2005008942A1[photomask with internal assistant pattern forenhancing resolution of multi-dimension pattern]Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →