Inventor · disambiguated record
Yutaka Fujino
Also filed as: FUJINO YUTAKA
21 granted patents·4 pending applications·49 citations·filing 1997–2022
91Inventor score
Top patents by PatentIndex Score
25 records- 0186US7674722B2Method of forming gate insulating film, semiconductor device and computer recording mediumTOKYO ELECTRON LTD·Filed 2005·Granted Mar 9, 2010·11 cites·7 claims
- 0283US9663856B2Plasma processing apparatus and shower plateTOKYO ELECTRON LTD·Filed 2014·Granted May 30, 2017·5 cites·8 claims
- 0379US10170347B2Substrate processing systemTOKYO ELECTRON LTD·Filed 2015·Granted Jan 1, 2019·3 cites·6 claims
- 0476US9520272B2Microwave emission mechanism, microwave plasma source and surface wave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Dec 13, 2016·3 cites·15 claims
- 0565US8961735B2Plasma processing apparatus and microwave introduction deviceFUJINO YUTAKA·Filed 2012·Granted Feb 24, 2015·2 cites·6 claims
- 0663US9548187B2Microwave radiation antenna, microwave plasma source and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jan 17, 2017·1 cites·7 claims
- 0763US7915177B2Method of forming gate insulation film, semiconductor device, and computer recording mediumTOYKO ELECTRON LTD·Filed 2010·Granted Mar 29, 2011·1 cites·8 claims
- 0862US9702913B2Acquisition method for S-parameters in microwave introduction modules, and malfunction detection methodTOKYO ELECTRON LTD·Filed 2013·Granted Jul 11, 2017·2 cites·12 claims
- 0961US12077865B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Sep 3, 2024·0 cites·15 claims
- 1060US10557200B2Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plateTOKYO ELECTRON LTD·Filed 2014·Granted Feb 11, 2020·1 cites·6 claims
- 1160US6047682AAccumulating type fuel injection controlMITSUBISHI MOTORS CORP·Filed 1997·Granted Apr 11, 2000·20 cites·10 claims
- 1258US2023062105A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1357US12060641B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Aug 13, 2024·0 cites·20 claims
- 1453US10879069B2Method and apparatus for forming hard mask film and method for manufacturing semiconductor devicesTOKYO ELECTRON LTD·Filed 2019·Granted Dec 29, 2020·0 cites·19 claims
- 1550US12112921B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Oct 8, 2024·0 cites·6 claims
- 1649US12129544B2Cleaning method and plasma treatment deviceTOKYO ELECTRON LTD·Filed 2021·Granted Oct 29, 2024·0 cites·10 claims
- 1747US10211032B2Microwave plasma source and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Feb 19, 2019·0 cites·9 claims
- 1846US9991097B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jun 5, 2018·0 cites·6 claims
- 1946US2015144265A1Plasma processing apparatus and microwave introduction deviceTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 2046US2011017706A1Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2142US10153169B2Method of controlling threshold of transistor and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2017·Granted Dec 11, 2018·0 cites·16 claims
- 2241US9640388B2Method for forming insulating film and method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2016·Granted May 2, 2017·0 cites·19 claims
- 2338US2009239364A1Method for forming insulating film and method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 2436US10804078B2Plasma processing apparatus and gas introduction mechanismTOKYO ELECTRON LTD·Filed 2017·Granted Oct 13, 2020·0 cites·13 claims
- 2533US9887081B2Method for manufacturing insulating film laminated structureTOKYO ELECTRON LTD·Filed 2016·Granted Feb 6, 2018·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →