Inventor · disambiguated record
Yuji Harada
Also filed as: HARADA YUJI
91 granted patents·11 pending applications·1,329 citations·filing 2000–2023
99Inventor score
Top patents by PatentIndex Score
102 records- 0199US7598016B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Oct 6, 2009·107 cites·13 claims
- 0298US7771914B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 10, 2010·90 cites·18 claims
- 0398US7771913B2Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 10, 2010·55 cites·27 claims
- 0498US7670750B2Polymer, resist protective coating material, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 2, 2010·65 cites·25 claims
- 0598US7537880B2Polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted May 26, 2009·258 cites·10 claims
- 0698US7455952B2Patterning process and resist overcoat materialSHINETSU CHEMICAL CO·Filed 2005·Granted Nov 25, 2008·63 cites·16 claims
- 0796US7759047B2Resist protective film composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jul 20, 2010·33 cites·15 claims
- 0896US7514204B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Apr 7, 2009·40 cites·12 claims
- 0995US7622242B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Nov 24, 2009·25 cites·12 claims
- 1094US8057981B2Resist composition, resist protective coating composition, and patterning processHARADA YUJI·Filed 2009·Granted Nov 15, 2011·19 cites·16 claims
- 1194US7642034B2Polymer, resist protective coating material, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jan 5, 2010·22 cites·8 claims
- 1293US8252504B2Polymer, resist composition, and patterning processHARADA YUJI·Filed 2009·Granted Aug 28, 2012·19 cites·9 claims
- 1392US8323872B2Resist protective coating material and patterning processHATAKEYAMA JUN·Filed 2006·Granted Dec 4, 2012·15 cites·7 claims
- 1492US8268528B2Resist composition and patterning processHARADA YUJI·Filed 2009·Granted Sep 18, 2012·14 cites·19 claims
- 1591US8101335B2Resist composition and patterning processHARADA YUJI·Filed 2009·Granted Jan 24, 2012·15 cites·12 claims
- 1691US7276623B2Polymerizable ester compoundsCENTRAL GLASS CO LTD·Filed 2006·Granted Oct 2, 2007·10 cites·3 claims
- 1790US8431323B2Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning processWATANABE TAKERU·Filed 2009·Granted Apr 30, 2013·7 cites·28 claims
- 1889US10696779B2Silicon-containing compound, urethane resin, stretchable film, and method for forming the sameSHINETSU CHEMICAL CO·Filed 2018·Granted Jun 30, 2020·2 cites·7 claims
- 1989US8313886B2Resist composition and patterning processHARADA YUJI·Filed 2010·Granted Nov 20, 2012·9 cites·14 claims
- 2089US7332616B2Polymerizable compound, polymer, positive-resist composition, and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Feb 19, 2008·9 cites·1 claims
- 2188US7488567B2Polymer, resist composition and patterning processPANASONIC CORP·Filed 2006·Granted Feb 10, 2009·9 cites·20 claims
- 2288US6579658B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jun 17, 2003·29 cites·18 claims
- 2387US12147160B2Resist underlayer film material, patterning process, and method for forming resist underlayer filmSHINETSU CHEMICAL CO·Filed 2021·Granted Nov 19, 2024·1 cites·11 claims
- 2487US10550136B2Method for producing polyalkylene glycol derivative having amino group at endSHINETSU CHEMICAL CO·Filed 2019·Granted Feb 4, 2020·1 cites·1 claims
- 2587US7666967B2Ester compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Feb 23, 2010·5 cites·4 claims
- 2686US8420292B2Polymer, resist composition, and patterning processHARADA YUJI·Filed 2011·Granted Apr 16, 2013·6 cites·24 claims
- 2785US10717804B2Silicon-containing compound, urethane resin, stretchable film, and method for forming the sameSHINETSU CHEMICAL CO·Filed 2018·Granted Jul 21, 2020·1 cites·13 claims
- 2885US8916331B2Resist composition and patterning processHASEGAWA KOJI·Filed 2011·Granted Dec 23, 2014·5 cites·16 claims
- 2985US7666572B2Resist top coat composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Feb 23, 2010·7 cites·25 claims
- 3084US10472377B2Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiatorSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 12, 2019·1 cites·3 claims
- 3184US8697903B2Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acidKINSHO TAKESHI·Filed 2011·Granted Apr 15, 2014·3 cites·1 claims
- 3284US8158330B2Resist protective coating composition and patterning processHARADA YUJI·Filed 2009·Granted Apr 17, 2012·7 cites·21 claims
- 3383US7592407B2Polymerizable fluorinated compound, making method, polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Sep 22, 2009·3 cites·4 claims
- 3483US6875556B2Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Apr 5, 2005·20 cites·9 claims
- 3583US6710148B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 23, 2004·20 cites·20 claims
- 3682US6369279B1Styrene derivativesSHINETSU CHEMICAL CO·Filed 2000·Granted Apr 9, 2002·12 cites·25 claims
- 3781US10836861B2Methods of preparing and purifying polyalkylene glycol derivativeSHINETSU CHEMICAL CO·Filed 2018·Granted Nov 17, 2020·1 cites·17 claims
- 3881US6461791B1Polymers, chemical amplification resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Oct 8, 2002·20 cites·34 claims
- 3980US10377775B2Method for producing polyalkylene glycol derivative having amino group at endSHINETSU CHEMICAL CO·Filed 2015·Granted Aug 13, 2019·1 cites·16 claims
- 4080US6436606B1Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Aug 20, 2002·17 cites·21 claims
- 4179US9708350B2Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiatorSHINETSU CHEMICAL CO·Filed 2015·Granted Jul 18, 2017·1 cites·21 claims
- 4278US11066430B2Method for producing polyalkylene glycol derivative having amino group at endSHINETSU CHEMICAL CO·Filed 2019·Granted Jul 20, 2021·0 cites·3 claims
- 4378US6790591B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Sep 14, 2004·15 cites·8 claims
- 4476US6835524B2Polymers, chemical amplification resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 28, 2004·15 cites·13 claims
- 4576US6461789B1Polymers, chemical amplification resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Oct 8, 2002·14 cites·26 claims
- 4675US7125641B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·13 cites·17 claims
- 4775US6872514B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 29, 2005·13 cites·16 claims
- 4874US7125643B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·11 cites·16 claims
- 4974US6878501B2Polymer, chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Apr 12, 2005·31 cites·29 claims
- 5070US6511787B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 28, 2003·25 cites·7 claims
Showing the top 50 of 102 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →