Inventor · disambiguated record
Yuki Hosaka
Also filed as: HOSAKA YUKI
12 granted patents·7 pending applications·8 citations·filing 2010–2025
82Inventor score
Top patents by PatentIndex Score
19 records- 0191US11804366B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Oct 31, 2023·2 cites·13 claims
- 0283US12374531B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 29, 2025·1 cites·16 claims
- 0379US11101114B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Aug 24, 2021·3 cites·6 claims
- 0474US2025293005A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0572US10192774B2Temperature control device for processing target object and method of selectively etching nitride film from multilayer filmTOKYO ELECTRON LTD·Filed 2015·Granted Jan 29, 2019·2 cites·6 claims
- 0665US11348768B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted May 31, 2022·0 cites·13 claims
- 0763US2025364224A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0862US12347654B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 1, 2025·0 cites·4 claims
- 0959US2021320009A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1052US12334313B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Jun 17, 2025·0 cites·15 claims
- 1148US2016260582A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1246US2019131136A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1338US10541142B2Maintenance method of plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jan 21, 2020·0 cites·16 claims
- 1438US10510514B2Gas supply mechanism and semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Dec 17, 2019·0 cites·13 claims
- 1537US2019131158A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1635US2010216082A1Work stationTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 1734US10950467B2Gas supply mechanism and semiconductor manufacturing systemTOKYO ELECTRON LTD·Filed 2017·Granted Mar 16, 2021·0 cites·17 claims
- 1834US9589771B2Plasma processing apparatusHOSAKA YUKI·Filed 2012·Granted Mar 7, 2017·0 cites·12 claims
- 1934US9011635B2Plasma processing apparatusHOSAKA YUKI·Filed 2012·Granted Apr 21, 2015·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →