Inventor · disambiguated record
Yusaku Kashiwagi
Also filed as: KASHIWAGI YUSAKU
14 granted patents·13 pending applications·557 citations·filing 2002–2025
91Inventor score
Top patents by PatentIndex Score
27 records- 0198US8378464B2Method for manufacturing semiconductor device, semiconductor device, semiconductor manufacturing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2010·Granted Feb 19, 2013·463 cites·6 claims
- 0296US10041174B2Method for forming carbon nanotubes and carbon nanotube film forming apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Aug 7, 2018·39 cites·5 claims
- 0396US9059178B2Method for forming carbon nanotubes and carbon nanotube film forming apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Jun 16, 2015·36 cites·20 claims
- 0488US10453681B2Method of selective vertical growth of a dielectric material on a dielectric substrateTOKYO ELECTRON LTD·Filed 2018·Granted Oct 22, 2019·5 cites·20 claims
- 0582US9293543B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Mar 22, 2016·5 cites·19 claims
- 0680US9219008B2Graphene patterning method and patterning memberTOKYO ELECTRON LTD·Filed 2014·Granted Dec 22, 2015·2 cites·6 claims
- 0776US10833166B2Semiconductor device including an MIS structureROHM CO LTD·Filed 2017·Granted Nov 10, 2020·2 cites·15 claims
- 0872US7867922B2Film forming method for dielectric filmTOKYO ELECTRON LTD·Filed 2006·Granted Jan 11, 2011·1 cites·7 claims
- 0967US7662728B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2006·Granted Feb 16, 2010·2 cites·20 claims
- 1058US2025263831A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1156US2025207245A1Film formation method and film formation deviceTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1254US8691338B2Polymerized film forming method and polymerized film forming apparatusKAWANO YUMIKO·Filed 2009·Granted Apr 8, 2014·0 cites·9 claims
- 1354US2016067680A1Graphene patterning method and patterning memberTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 1454US2009011149A1Substrate processing methodTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1554US2010132613A1Fabrication of low dielectric constant insulating filmTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1649US7601402B2Method for forming insulation film and apparatus for forming insulation filmTOKYO ELECTRON LTD·Filed 2003·Granted Oct 13, 2009·2 cites·13 claims
- 1749US2015214423A1Method for manufacturing optical device and optical deviceTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1848US11041239B2Film forming method for SiC filmTOKYO ELECTRON LTD·Filed 2017·Granted Jun 22, 2021·0 cites·2 claims
- 1945US10490443B2Selective film forming method and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2018·Granted Nov 26, 2019·0 cites·8 claims
- 2045US2011023784A1EvaporatorKASHIWAGI YUSAKU·Filed 2010·Application pending·0 cites
- 2145US2009053895A1Film forming method of porous film and computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2242US7645481B2Fabrication of low dielectric constant insulating filmTOKYO ELECTRON LTD·Filed 2004·Granted Jan 12, 2010·0 cites·10 claims
- 2341US2008184543A1Method and apparatus for manufacturing semiconductor device, and storage medium for executing the methodTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2440US2015001588A1Semiconductor device and method for manufacturing sameTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2539US2004253839A1Semiconductor manufacturing apparatus and heat treatment methodTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 2636US2004253777A1Method and apparatus for forming filmFiled 2002·Application pending·0 cites
- 2733US2015214429A1Method for manufacturing rod-type light emitting device and rod-type light emitting deviceTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →