Inventor · disambiguated record
Yuzo Koda
Also filed as: KODA YUZO
20 granted patents·1 pending application·434 citations·filing 1991–2007
96Inventor score
Files withCANON KK21
Top patents by PatentIndex Score
21 records- 0193US5720826APhotovoltaic element and fabrication process thereofCANON KK·Filed 1996·Granted Feb 24, 1998·132 cites·42 claims
- 0289US6794275B2Process for forming a silicon-based film on a substrate using a temperature gradient across the substrate axisCANON KK·Filed 2002·Granted Sep 21, 2004·48 cites·37 claims
- 0380US6447612B1Film-forming apparatus for forming a deposited film on a substrate, and vacuum-processing apparatus and method for vacuum-processing an objectCANON KK·Filed 2000·Granted Sep 10, 2002·19 cites·27 claims
- 0477US6653165B2Methods of forming semiconductor element, and semiconductor elementsCANON KK·Filed 2002·Granted Nov 25, 2003·22 cites·20 claims
- 0573US6495392B2Process for producing a semiconductor deviceCANON KK·Filed 2001·Granted Dec 17, 2002·17 cites·11 claims
- 0672US5769963APhotovoltaic deviceCANON KK·Filed 1996·Granted Jun 23, 1998·39 cites·38 claims
- 0770US6287943B1Deposition of semiconductor layer by plasma processCANON KK·Filed 1999·Granted Sep 11, 2001·28 cites·24 claims
- 0867US5281541AMethod for repairing an electrically short-circuited semiconductor device, and process for producing a semiconductor device utilizing said methodCANON KK·Filed 1991·Granted Jan 25, 1994·23 cites·12 claims
- 0965US6472296B2Fabrication of photovoltaic cell by plasma processCANON KK·Filed 2001·Granted Oct 29, 2002·7 cites·26 claims
- 1064US6436797B1Apparatus and method for forming a deposited film on a substrateCANON KK·Filed 2000·Granted Aug 20, 2002·7 cites·12 claims
- 1161US5439533APhotovoltaic device, method of producing the same and generating system using the sameCANON KK·Filed 1994·Granted Aug 8, 1995·22 cites·44 claims
- 1261US2007169890A1Exhaust processing method, plasma processing method and plasma processing apparatusCANON KK·Filed 2007·Application pending·0 cites
- 1359US6470823B2Apparatus and method for forming a deposited film by a means of plasma CVDCANON KK·Filed 2001·Granted Oct 29, 2002·4 cites·6 claims
- 1458US5418680AApparatus for repairing an electrically short-circuited semiconductor deviceCANON KK·Filed 1993·Granted May 23, 1995·16 cites·3 claims
- 1557US7211708B2Exhaust processing method, plasma processing method and plasma processing apparatusCANON KK·Filed 2001·Granted May 1, 2007·2 cites·6 claims
- 1656US6877458B2Apparatus for forming deposited filmCANON KK·Filed 2001·Granted Apr 12, 2005·2 cites·7 claims
- 1755US5371380ASi- and/or Ge-containing non-single crystalline semiconductor film with an average radius of 3.5 A or less as for microvoids contained therein and a microvoid density 1×10.sup.(19) (cm-3) or lessCANON KK·Filed 1994·Granted Dec 6, 1994·23 cites·61 claims
- 1853US5362684ANon-monocrystalline silicon carbide semiconductor, process of production thereof, and semiconductor device employing the sameCANON KK·Filed 1992·Granted Nov 8, 1994·13 cites·6 claims
- 1948US5510631ANon-monocrystalline silicon carbide semiconductor and semiconductor device employing the sameCANON KK·Filed 1994·Granted Apr 23, 1996·10 cites·14 claims
- 2045US6846521B2Apparatus and method for forming deposited filmCANON KK·Filed 2003·Granted Jan 25, 2005·0 cites·6 claims
- 2142US6632284B2Apparatus and method for forming deposited filmCANON KK·Filed 2001·Granted Oct 14, 2003·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →