Inventor · disambiguated record
Yuri Makarov
Also filed as: MAKAROV YURI · MAKAROV YURI V
8 granted patents·2 pending applications·81 citations·filing 2004–2019
84Inventor score
Files withMAKAROV YURI3BATTELLE MEMORIAL INSTITUTE1CORNELL RES FOUNDATION INC1FORSCHUNGSZENTRUM JUELICH GMBH1JIN CHUNLIAN1
Top patents by PatentIndex Score
10 records- 0194US8329252B2Method for the growth of SiC, by chemical vapor deposition, using precursors in modified cold-wall reactorMAKAROV YURI·Filed 2011·Granted Dec 11, 2012·52 cites·1 claims
- 0282US11387651B2Coordinated voltage control and reactive power regulation between transmission and distribution systemsBATTELLE MEMORIAL INSTITUTE·Filed 2019·Granted Jul 12, 2022·8 cites·20 claims
- 0381US7901508B2Method, system, and apparatus for the growth of SiC and related or similar material, by chemical vapor deposition, using precursors in modified cold-wall reactorWIDETRONIX INC·Filed 2007·Granted Mar 8, 2011·6 cites·9 claims
- 0474US8754547B2Controller for hybrid energy storageJIN CHUNLIAN·Filed 2010·Granted Jun 17, 2014·10 cites·18 claims
- 0572US11070647B1Seamless cross-platform synchronization of user activities and application data between mobile and desktop devicesPARALLELS INT GMBH·Filed 2017·Granted Jul 20, 2021·2 cites·19 claims
- 0668US8088222B2Method, system, and apparatus for the growth of on-axis SiC and similar semiconductor materialsMAKAROV YURI·Filed 2007·Granted Jan 3, 2012·1 cites·15 claims
- 0766US9362749B2Controller for thermostatically controlled loadsLU NING·Filed 2012·Granted Jun 7, 2016·2 cites·23 claims
- 0856US2008173239A1Method, system, and apparatus for the growth of SiC and related or similar material, by chemical vapor deposition, using precursors in modified cold-wall reactorMAKAROV YURI·Filed 2007·Application pending·0 cites
- 0945US7867335B2GaN bulk growth by Ga vapor transportCORNELL RES FOUNDATION INC·Filed 2006·Granted Jan 11, 2011·0 cites·32 claims
- 1041US2007031991A1Method for depositing compounds on a substrate by means of metalorganic chemical vapor depositionFORSCHUNGSZENTRUM JUELICH GMBH·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →