Inventor · disambiguated record
Yukito Nakagawa
Also filed as: NAKAGAWA YUKITO
18 granted patents·2 pending applications·400 citations·filing 1987–2017
95Inventor score
Top patents by PatentIndex Score
20 records- 0196US6462482B1Plasma processing system for sputter deposition applicationsANELVA CORP·Filed 2000·Granted Oct 8, 2002·87 cites·13 claims
- 0292US9685299B2Substrate processing apparatus, etching method of metal film, and manufacturing method of magnetoresistive effect elementCANON ANELVA CORP·Filed 2012·Granted Jun 20, 2017·14 cites·16 claims
- 0390US6043608APlasma processing apparatusNEC CORP·Filed 1997·Granted Mar 28, 2000·73 cites·9 claims
- 0484US5565738APlasma processing apparatus which uses a uniquely shaped antenna to reduce the overall size of the apparatus with respect to the plasma chamberNEC CORP·Filed 1995·Granted Oct 15, 1996·53 cites·13 claims
- 0583US8475672B2Plasma processing device, plasma processing method and method of manufacturing element including substrate to be processedIORI KAZUYUKI·Filed 2011·Granted Jul 2, 2013·10 cites·16 claims
- 0681US4919783AApparatus for processing an object by gas plasma with a reduced damageANELVA CORP·Filed 1987·Granted Apr 24, 1990·30 cites·17 claims
- 0779US6339997B1Plasma processing apparatusANELVA CORP·Filed 2000·Granted Jan 22, 2002·21 cites·10 claims
- 0877US6664496B2Plasma processing systemANELVA CORP·Filed 2002·Granted Dec 16, 2003·13 cites·5 claims
- 0976US5900699APlasma generator with a shield interposing the antennaNEC CORP·Filed 1997·Granted May 4, 1999·49 cites·10 claims
- 1075US9734989B2Method for manufacturing semiconductor device, ion beam etching device, and control deviceCANON ANELVA CORP·Filed 2013·Granted Aug 15, 2017·3 cites·18 claims
- 1175US9190287B2Method of fabricating fin FET and method of fabricating deviceCANON ANELVA CORP·Filed 2014·Granted Nov 17, 2015·3 cites·10 claims
- 1270US10026591B2Method for manufacturing semiconductor device, ion beam etching device, and control deviceCANON ANELVA CORP·Filed 2017·Granted Jul 17, 2018·1 cites·3 claims
- 1368US5936352APlasma processing apparatus for producing plasma at low electron temperaturesNEC CORP·Filed 1996·Granted Aug 10, 1999·20 cites·28 claims
- 1463US6376796B2Plasma processing systemSATO NORIYOSHI·Filed 2000·Granted Apr 23, 2002·8 cites·9 claims
- 1559US2008113149A1Surface processing apparatusANELVA CORP·Filed 2007·Application pending·0 cites
- 1653US8007633B2Surface processing apparatusCANON ANELVA CORP·Filed 2011·Granted Aug 30, 2011·0 cites·3 claims
- 1752US9721747B2Grid, method of manufacturing the same, and ion beam processing apparatusCANON ANELVA CORP·Filed 2016·Granted Aug 1, 2017·0 cites·5 claims
- 1850US5961776ASurface processing apparatusANELVA CORP·Filed 1997·Granted Oct 5, 1999·15 cites·5 claims
- 1946US9640754B2Process for producing magnetoresistive effect elementCANON ANELVA CORP·Filed 2013·Granted May 2, 2017·0 cites·13 claims
- 2040US2003024478A1Surface processing apparatusANELVA CORP·Filed 2002·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Yukito Nakagawa files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →