Inventor · disambiguated record
Yuhou Wang
Also filed as: WANG YUHOU
20 granted patents·12 pending applications·63 citations·filing 2017–2025
93Inventor score
Files withLAM RES CORP32
Top patents by PatentIndex Score
32 records- 0198US10264663B1Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2017·Granted Apr 16, 2019·29 cites·46 claims
- 0297US11716805B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2021·Granted Aug 1, 2023·4 cites·20 claims
- 0396US11224116B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2020·Granted Jan 11, 2022·4 cites·19 claims
- 0496US10638593B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2019·Granted Apr 28, 2020·10 cites·20 claims
- 0593US11728136B2RF pulsing within pulsing for semiconductor RF plasma processingLAM RES CORP·Filed 2022·Granted Aug 15, 2023·2 cites·20 claims
- 0692US2025391638A1Rf pulsing within pulsing for semiconductor rf plasma processingLAM RES CORP·Filed 2025·Application pending·0 cites
- 0791US10957521B2Image based plasma sheath profile detection on plasma processing toolsLAM RES CORP·Filed 2018·Granted Mar 23, 2021·6 cites·10 claims
- 0889US2025106976A1Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2024·Application pending·0 cites
- 0986US10672590B2Frequency tuning for a matchless plasma sourceLAM RES CORP·Filed 2018·Granted Jun 2, 2020·3 cites·15 claims
- 1084US12193138B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2023·Granted Jan 7, 2025·0 cites·14 claims
- 1183US12507338B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2025·Granted Dec 23, 2025·0 cites·30 claims
- 1282US12490370B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2025·Granted Dec 2, 2025·0 cites·30 claims
- 1382US12484139B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2025·Granted Nov 25, 2025·0 cites·30 claims
- 1482US12471202B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2025·Granted Nov 11, 2025·0 cites·13 claims
- 1581US2025079121A1Dual-frequency, direct-drive inductively coupled plasma sourceLAM RES CORP·Filed 2024·Application pending·0 cites
- 1680US11342159B2RF pulsing within pulsing for semiconductor RF plasma processingLAM RES CORP·Filed 2018·Granted May 24, 2022·2 cites·33 claims
- 1780US2025345945A1Substrate location detection and adjustmentLAM RES CORP·Filed 2025·Application pending·0 cites
- 1878US12424410B2RF pulsing within pulsing for semiconductor RF plasma processingLAM RES CORP·Filed 2023·Granted Sep 23, 2025·0 cites·20 claims
- 1977US10879044B2Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsingLAM RES CORP·Filed 2018·Granted Dec 29, 2020·2 cites·15 claims
- 2077US2025273447A1Protection system for switches in direct drive circuits of substrate processing systemsLAM RES CORP·Filed 2025·Application pending·0 cites
- 2172US12261029B2Protection system for switches in direct drive circuits of substrate processing systemsLAM RES CORP·Filed 2021·Granted Mar 25, 2025·0 cites·24 claims
- 2272US11728137B2Direct frequency tuning for matchless plasma source in substrate processing systemsLAM RES CORP·Filed 2019·Granted Aug 15, 2023·1 cites·16 claims
- 2368US12165841B2Dual-frequency, direct-drive inductively coupled plasma sourceLAM RES CORP·Filed 2020·Granted Dec 10, 2024·0 cites·11 claims
- 2468US11437219B2Frequency tuning for a matchless plasma sourceLAM RES CORP·Filed 2020·Granted Sep 6, 2022·0 cites·22 claims
- 2559US12397435B2Substrate location detection and adjustmentLAM RES CORP·Filed 2020·Granted Aug 26, 2025·0 cites·22 claims
- 2656US2024396372A1Junction System for Direct-Drive Radiofrequency Power SupplyLAM RES CORP·Filed 2022·Application pending·0 cites
- 2754US2025046572A1A method and apparatus for enhancing ion energy and reducing ion energy spread in an inductively coupled plasmaLAM RES CORP·Filed 2022·Application pending·0 cites
- 2854US2024404804A1Reference Box for Direct-Drive Radiofrequency Power SupplyLAM RES CORP·Filed 2022·Application pending·0 cites
- 2954US2024395519A1Metrology Enclosure Including Spectral Reflectometry System for Plasma Processing System Using Direct-Drive Radiofrequency Power SupplyLAM RES CORP·Filed 2022·Application pending·0 cites
- 3050US2025174431A1Apparatus and Method for Splitting Current from Direct-Drive Radiofrequency Signal Generator between Multiple CoilsLAM RES CORP·Filed 2022·Application pending·0 cites
- 3147US2023126058A1Dielectric window for substrate processing chamberLAM RES CORP·Filed 2021·Application pending·0 cites
- 3238US2017263478A1Detection System for Tunable/Replaceable Edge Coupling RingLAM RES CORP·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →