Inventor · disambiguated record
Yuichiro Yamazaki
Also filed as: YAMAZAKI YUICHIRO
74 granted patents·11 pending applications·1,981 citations·filing 1986–2019
99Inventor score
Top patents by PatentIndex Score
85 records- 0198US9368314B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2014·Granted Jun 14, 2016·38 cites·10 claims
- 0298US8035082B2Projection electron beam apparatus and defect inspection system using the apparatusTOSHIBA KK·Filed 2009·Granted Oct 11, 2011·46 cites·2 claims
- 0398US6992290B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemTOSHIBA KK·Filed 2001·Granted Jan 31, 2006·97 cites·5 claims
- 0497US7351969B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemEBARA CORP·Filed 2005·Granted Apr 1, 2008·37 cites·5 claims
- 0597US6909092B2Electron beam apparatus and device manufacturing method using sameTOSHIBA KK·Filed 2003·Granted Jun 21, 2005·77 cites·17 claims
- 0697US6563308B2Eddy current loss measuring sensor, thickness measuring system, thickness measuring method, and recorded mediumTOSHIBA KK·Filed 2001·Granted May 13, 2003·144 cites·47 claims
- 0797US6534766B2Charged particle beam system and pattern slant observing methodTOSHIBA KK·Filed 2001·Granted Mar 18, 2003·93 cites·23 claims
- 0897US5576833AWafer pattern defect detection method and apparatus thereforTOSHIBA KK·Filed 1995·Granted Nov 19, 1996·176 cites·11 claims
- 0996US7569838B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemEBARA CORP·Filed 2008·Granted Aug 4, 2009·23 cites·5 claims
- 1096US6265719B1Inspection method and apparatus using electron beamTOSHIBA KK·Filed 1998·Granted Jul 24, 2001·121 cites·15 claims
- 1196US6038018ASubstrate inspecting apparatus, substrate inspecting system having the same apparatus and substrate inspecting methodTOSHIBA KK·Filed 1999·Granted Mar 14, 2000·124 cites·16 claims
- 1296US5429730AMethod of repairing defect of structureTOSHIBA KK·Filed 1993·Granted Jul 4, 1995·114 cites·54 claims
- 1395US7411191B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2007·Granted Aug 12, 2008·20 cites·4 claims
- 1494US7241993B2Inspection system by charged particle beam and method of manufacturing devices using the systemTOSHIBA KK·Filed 2001·Granted Jul 10, 2007·54 cites·12 claims
- 1594US6259094B1Electron beam inspection method and apparatusTOSHIBA KK·Filed 1998·Granted Jul 10, 2001·92 cites·6 claims
- 1693US6525328B1Electron beam lithography system and pattern writing methodTOSHIBA KK·Filed 2000·Granted Feb 25, 2003·50 cites·22 claims
- 1791US8053726B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2008·Granted Nov 8, 2011·11 cites·11 claims
- 1891US5371371AMagnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lensTOSHIBA KK·Filed 1993·Granted Dec 6, 1994·67 cites·14 claims
- 1990US8803103B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2013·Granted Aug 12, 2014·6 cites·7 claims
- 2088US5639699AFocused ion beam deposition using TMCTSTOSHIBA KK·Filed 1995·Granted Jun 17, 1997·62 cites·11 claims
- 2188US5539211ACharged beam apparatus having cleaning function and method of cleaning charged beam apparatusTOSHIBA KK·Filed 1994·Granted Jul 23, 1996·56 cites·30 claims
- 2288US4902131ASurface inspection method and apparatus thereforTOSHIBA KK·Filed 1986·Granted Feb 20, 1990·64 cites·17 claims
- 2386US6991878B2Photomask repair method and apparatusTOSHIBA KK·Filed 2002·Granted Jan 31, 2006·23 cites·18 claims
- 2484US7483155B2Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatusTOSHIBA KK·Filed 2005·Granted Jan 27, 2009·6 cites·10 claims
- 2584US7098457B2Electron beam apparatus and device manufacturing method using sameTOSHIBA KK·Filed 2005·Granted Aug 29, 2006·6 cites·16 claims
- 2683US8368031B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2011·Granted Feb 5, 2013·3 cites·7 claims
- 2783US8067732B2Electron beam apparatusNAKASUJI MAMORU·Filed 2006·Granted Nov 29, 2011·8 cites·4 claims
- 2882US7863580B2Electron beam apparatus and an aberration correction optical apparatusEBARA CORP·Filed 2007·Granted Jan 4, 2011·7 cites·8 claims
- 2981US9457798B2Hybrid vehicle and method for controlling sameHONDA MOTOR CO LTD·Filed 2013·Granted Oct 4, 2016·10 cites·10 claims
- 3081US7609470B2Information storage device, write current adjustment method for the information storage device, and write control circuitFUJITSU LTD·Filed 2006·Granted Oct 27, 2009·4 cites·15 claims
- 3181US7462829B2Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2007·Granted Dec 9, 2008·4 cites·10 claims
- 3280US6512237B2Charged beam exposure method and charged beam exposure apparatusTOSHIBA KK·Filed 2002·Granted Jan 28, 2003·13 cites·3 claims
- 3380US5548183AMagnetic field immersion type electron gunTOSHIBA KK·Filed 1994·Granted Aug 20, 1996·35 cites·8 claims
- 3480US5444256AElectrostatic lens and method for producing the sameTOSHIBA KK·Filed 1993·Granted Aug 22, 1995·29 cites·10 claims
- 3579US8000046B2Storage device, processor or storage device, and computer program product for providing parameter adjustment during read/write operationsTOSHIBA STORAGE DEVICE CORP·Filed 2009·Granted Aug 16, 2011·3 cites·20 claims
- 3677US8649591B2Pattern inspection apparatus and pattern inspection methodKANEKO MAKOTO·Filed 2011·Granted Feb 11, 2014·4 cites·20 claims
- 3777US7504625B2Substrate inspection method, manufacturing method of semiconductor device and substrate inspection apparatusTOSHIBA KK·Filed 2006·Granted Mar 17, 2009·4 cites·22 claims
- 3877US6495841B1Charged beam drawing apparatusTOSHIBA KK·Filed 1999·Granted Dec 17, 2002·30 cites·8 claims
- 3976US6940080B2Charged particle beam lithography system, lithography method using charged particle beam, method of controlling charged particle beam, and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2003·Granted Sep 6, 2005·12 cites·40 claims
- 4075US7212017B2Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatusTOSHIBA KK·Filed 2004·Granted May 1, 2007·15 cites·7 claims
- 4174US5138169AMethod and apparatus for irradiating low-energy electronsTOSHIBA KK·Filed 1991·Granted Aug 11, 1992·25 cites·14 claims
- 4273US7777979B2Magnetic disk device testing method and testing deviceTOSHIBA STORAGE DEVICE CORP·Filed 2008·Granted Aug 17, 2010·2 cites·5 claims
- 4373US7148479B2Defect inspection apparatus, program, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2005·Granted Dec 12, 2006·3 cites·5 claims
- 4472US7449691B2Detecting apparatus and device manufacturing methodEBARA CORP·Filed 2006·Granted Nov 11, 2008·3 cites·4 claims
- 4572US5362968AOptic column having particular major/minor axis magnification ratioTOSHIBA KK·Filed 1993·Granted Nov 8, 1994·33 cites·5 claims
- 4671US7075072B2Detecting apparatus and device manufacturing methodTOSHIBA KK·Filed 2002·Granted Jul 11, 2006·12 cites·28 claims
- 4770US7211796B2Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2004·Granted May 1, 2007·6 cites·15 claims
- 4868US7645988B2Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatusTOSHIBA KK·Filed 2005·Granted Jan 12, 2010·2 cites·17 claims
- 4967US7674570B2Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2006·Granted Mar 9, 2010·2 cites·12 claims
- 5067US6815698B2Charged particle beam exposure systemTOKYO SHIBAURA ELECTRIC CO·Filed 2001·Granted Nov 9, 2004·11 cites·25 claims
Showing the top 50 of 85 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →