Inventor · disambiguated record

Zahra H. Amini

Also filed as: AMINI ZAHRA H

3 granted patents·86 citations·filing 1989–1995

74Inventor score

Technology areasH10P

Files withAPPLIED MATERIALS INC3

Top patents by PatentIndex Score

3 records

0164US5228950ADry process for removal of undesirable oxide and/or silicon residues from semiconductor wafer after processingAPPLIED MATERIALS INC·Filed 1990·Granted Jul 20, 1993·47 cites·23 claims
0263US5030590AProcess for etching polysilicon layer in formation of integrated circuit structureAPPLIED MATERIALS INC·Filed 1989·Granted Jul 9, 1991·31 cites·18 claims
0339US5938943ANear Substrate reactant Homogenization apparatusAPPLIED MATERIALS INC·Filed 1995·Granted Aug 17, 1999·8 cites·11 claims

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →