Inventor · disambiguated record
Zecheng Liu
Also filed as: LIU ZECHENG
12 granted patents·7 pending applications·6 citations·filing 2020–2025
83Inventor score
Files withASM IP HOLDING BV19
Top patents by PatentIndex Score
19 records- 0193US11342216B2Cyclical deposition method and apparatus for filling a recess formed within a substrate surfaceASM IP HOLDING BV·Filed 2020·Granted May 24, 2022·3 cites·20 claims
- 0290US11798834B2Cyclical deposition method and apparatus for filling a recess formed within a substrate surfaceASM IP HOLDING BV·Filed 2022·Granted Oct 24, 2023·1 cites·16 claims
- 0388US11227789B2Method and apparatus for filling a recess formed within a substrate surfaceASM IP HOLDING BV·Filed 2020·Granted Jan 18, 2022·2 cites·17 claims
- 0481US12272593B2Cyclical deposition method and apparatus for filling a recess formed within a substrate surfaceASM IP HOLDING BV·Filed 2023·Granted Apr 8, 2025·0 cites·3 claims
- 0578US12176243B2Method and apparatus for filling a recess formed within a substrate surfaceASM IP HOLDING BV·Filed 2022·Granted Dec 24, 2024·0 cites·15 claims
- 0677US2025320601A1Method and system for forming a silicon oxycarbide layer and structure formed using sameASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 0774US12359312B2Method and system for forming a silicon oxycarbide layer and structure formed using sameASM IP HOLDING BV·Filed 2023·Granted Jul 15, 2025·0 cites·20 claims
- 0872US11615980B2Method and apparatus for filling a recess formed within a substrate surfaceASM IP HOLDING BV·Filed 2021·Granted Mar 28, 2023·0 cites·3 claims
- 0966US2023420256A1Method of forming a photoresist underlayer and structure including sameASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 1060US2024361695A1STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-OXIDE RESIST AND METHODS OF FORMING SAMEASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 1157US12394626B2Method of forming a structure and system for sameASM IP HOLDING BV·Filed 2022·Granted Aug 19, 2025·0 cites·20 claims
- 1256US11735422B2Method of forming a photoresist underlayer and structure including sameASM IP HOLDING BV·Filed 2020·Granted Aug 22, 2023·0 cites·15 claims
- 1354US2023162971A1Method of forming sioc and siocn low-k spacersASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 1453US12107005B2Deposition method and an apparatus for depositing a silicon-containing materialASM IP HOLDING BV·Filed 2021·Granted Oct 1, 2024·0 cites·21 claims
- 1553US2022350248A1Method of forming an adhesion layer on a photoresist underlayer and structure including sameASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 1653US2025291252A1Structure including a photoresist underlayer and method of forming sameASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 1752US2023340663A1Plasma-enhanced method and system for forming a silicon oxycarbide layer and structure formed using sameplasma-enhanced method and system for forming a silicon oxycarbide layer and structure formed using sameASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 1851US12094769B2Methods for filling a gap and related systems and devicesASM IP HOLDING BV·Filed 2021·Granted Sep 17, 2024·0 cites·18 claims
- 1949US12027365B2Methods for filling a gap and related systems and devicesASM IP HOLDING BV·Filed 2021·Granted Jul 2, 2024·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →